High-rate deposition by microwave RPECVD at atmospheric pressure

Thin Solid Films

Volumn 519, Issue 13, 2011, Pages 4177-4185

  Cardoso, R P ^a   Belmonte, T ^a   Kosior, F ^a   Henrion, G ^a   Tixhon, E ^b  

^a INSTITUT JEAN LAMOUR   (France)

^b AGC Flat Coating ^*  (Belgium)

Author keywords

Afterglow; Hexamethyldisiloxane; Microwave assisted chemical vapor deposition; Plasma enhanced chemical vapor deposition; Post discharge; Resonant cavity

Indexed keywords

AFTERGLOW; HEXAMETHYL DISILOXANE; MICROWAVE ASSISTED CHEMICAL VAPOR DEPOSITION; POST DISCHARGE; RESONANT CAVITY;

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; CAVITY RESONATORS; COATINGS; DEPOSITION RATES; ELECTRIC DISCHARGES; MICROWAVES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON COMPOUNDS; THICKNESS MEASUREMENT; VAPOR DEPOSITION;

DEPOSITION;

EID: 79954433936     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.02.003     Document Type: Article

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