Self-organization of SiO2 nanodots deposited by chemical vapor deposition using an atmospheric pressure remote microplasma

Applied Physics Letters

Volumn 96, Issue 10, 2010, Pages

  Arnoult, G ^a   Belmonte, T ^a   Henrion, G ^a  

^a INSTITUT JEAN LAMOUR   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DE-WETTING; HEXAGONAL CELLS; HEXAMETHYL DISILOXANE; HIGH TEMPERATURE; HIGH-CONTENT; MICRO-PLASMAS; NANODOTS; NANORIBBONS; SELF-ORGANIZATIONS;

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; COATINGS; SILICON COMPOUNDS;

ATMOSPHERIC CHEMISTRY;

EID: 77949765846     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3360228     Document Type: Article

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