Analysis of mass transport in an atmospheric pressure remote plasma-enhanced chemical vapor deposition process

Journal of Applied Physics

Volumn 107, Issue 2, 2010, Pages

  Cardoso, R P ^a   Belmonte, T ^a   Henrion, G ^a   Gries, T ^a   Tixhon, E ^b  

^a CNRS   (France)

^b AGC Flat Coating ^*  (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

COATING PROPERTIES; GOOD MIXING; HIGH DEPOSITION RATES; HIGH-FLOW RATE; INJECTION NOZZLES; LAMINAR DIFFUSION; MASS TRANSPORT; MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITIONS; REACTIVE SPECIES; REMOTE PLASMAS; SMALL AREA; TURBULENT DIFFUSION;

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC MOVEMENTS; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; DEPOSITION; DEPOSITION RATES; DIFFUSION; MICROWAVES;

PLASMA DEPOSITION;

EID: 75749134568     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3294966     Document Type: Article

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