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Applied Surface Science

Volumn 257, Issue 14, 2011, Pages 6181-6185

TiAlN coatings deposited by triode magnetron sputtering varying the bias voltage

(5) Devia, D M a,b Restrepo Parra, E a Arango, P J a Tschiptschin, A P c Velez, J M b

a UNIVERSIDAD NACIONAL DE COLOMBIA (Colombia)

b UNIVERSIDAD NACIONAL DE COLOMBIA (Colombia)

c UNIVERSITY OF SÃO PAULO (Brazil)

Author keywords

Adhesion; Crystallography; Hardness; Microstructure; Titanium aluminum nitride

Indexed keywords

ADHESION; ALUMINUM NITRIDE; ATOMIC FORCE MICROSCOPY; BIAS VOLTAGE; COATINGS; CRYSTALLOGRAPHY; HARDNESS; ION BOMBARDMENT; MAGNETRON SPUTTERING; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; SODIUM CHLORIDE; TITANIUM ALLOYS; TITANIUM NITRIDE; TOOL STEEL; TRIODES; X RAY CRYSTALLOGRAPHY; X RAY DIFFRACTION;

BIAS VOLTAGE EFFECTS; CRYSTALLOGRAPHIC PLANE; ELEMENTAL COMPOSITIONS; ENERGY DISPERSIVE X-RAY; HIGH-ENERGY IONS; MAGNETRON SPUTTERING SYSTEMS; SUBSTRATE BIAS VOLTAGES; TITANIUM ALUMINUM NITRIDE;

ALUMINUM ALLOYS;

EID: 79953024671 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2011.02.027 Document Type: Article

Times cited : (99)

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