Correlation of elastic modulus, hardness and density for sputtered TiAlBN thin films

Thin Solid Films

Volumn 514, Issue 1-2, 2006, Pages 81-86

  Rebholz, C ^a   Leyland, A ^b   Matthews, A ^b   Charitidis, C ^c   Logothetidis, S ^d   Schneider, D ^e  

^a UNIVERSITY OF CYPRUS   (Cyprus)

^b UNIVERSITY OF SHEFFIELD   (United Kingdom)

^c NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

^d ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

^e FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS   (Germany)

Author keywords

Elastic properties; Hardness; Physical vapour deposition (PVD); Sputtering

Indexed keywords

AMORPHOUS FILMS; ARGON; ELASTIC MODULI; HARDNESS; MAGNETRON SPUTTERING; PHYSICAL VAPOR DEPOSITION; STAINLESS STEEL; THERMAL EFFECTS; THIN FILMS;

AISI 316 STAINLESS STEEL; ELASTIC PROPERTIES; FILM DENSITY; REACTIVE MAGNETRON SPUTTERING;

TITANIUM COMPOUNDS;

EID: 33745881068     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.02.038     Document Type: Article

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