Effect of substrate bias voltage on structural and mechanical properties of pulsed DC magnetron sputtered TiN-MoSx composite coatings

Vacuum

Volumn 84, Issue 6, 2010, Pages 843-850

  Gangopadhyay, S ^a   Acharya, R ^a   Chattopadhyay, A K ^a   Paul, S ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY   (India)

Author keywords

Adhesion; Bias voltage; Hardness; Pulsed magnetron sputtering; TiN MoSx composite coating; Wear test

Indexed keywords

PULSED MAGNETRON SPUTTERING; TIN-MOS; TIN-MOSX COMPOSITE COATING; WEAR TEST;

ADHESION; BIAS VOLTAGE; ENERGY DISPERSIVE SPECTROSCOPY; FIELD EMISSION; FIELD EMISSION MICROSCOPES; MAGNETRON SPUTTERING; MAGNETRONS; MECHANICAL PROPERTIES; MICROHARDNESS; MOLYBDENUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; STRUCTURAL PROPERTIES; SUBSTRATES; TESTING; TITANIUM NITRIDE; TUNGSTEN CARBIDE; WEAR RESISTANCE;

COMPOSITE COATINGS;

EID: 74649086933     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2009.11.010     Document Type: Article

References (32)

1. 2 solid film lubricants. Trib Int 32 (1999) 627-636
2. 2 coatings produced by dc magnetron co-deposition. Surf Coat Technol 108-109 (1998) 345-351
3. x hard coatings by a combined arc evaporation and magnetron sputter process. Surf Coat Technol 120-121 (1999) 453-457
4. x coating with Ti-TiN graded interlayer. Surf Coat Technol 200 (2005) 1071-1075
5. x-TiN composite coating for improved mechanical properties and tribological performance. Surf Coat Technol 203 (2009) 3295-3305
6. x composite coating deposited by pulsed closed-field unbalanced magnetron sputtering. Surf Coat Technol 203 (2009) 1565-1572
7. 2. Surf Coat Technol 105 (1998) 45-50
8. 2 thin films by D.C. magnetron sputtering. Surf Coat Technol 188-189 (2004) 174-178
9. Audronis M., Leyland A., Kelly P.J., and Matthews A. Composition and structure-property relationships of chromium-diboride/molybdenum-disulphide PVD nanocomposite hard coatings deposited by pulsed magnetron sputtering. Appl Phys A 91 (2008) 77-86
10. Schiller S., Goedicke K., Reschke J., Kirchhoff V., Schneider S., and Milde F. Pulsed magnetron sputter technology. Surf Coat Technol 61 (1993) 331-337
11. Sellers J. Asymmetric bipolar pulsed DC: the enabling technology for reactive PVD. Surf Coat Technol 98 (1998) 1245-1250
12. Kelly P.J., and Arnell R.D. Magnetron sputtering: a review of recent developments and applications. Vacuum 56 (2000) 159-172
13. Kelly P.J., Beevers C.F., Henderson P.S., Arnell R.D., Bradley J.W., and Backer H. A comparison of the properties of titanium-based films produced by pulsed and continuous DC magnetron sputtering. Surf Coat Technol 174-175 (2003) 795-800
14. Kelly P.J., vom Braucke T., Liu Z., Arnell R.D., and Doyle E.D. Pulsed DC titanium nitride coatings for improved tribological performance and tool life. Surf Coat Technol 202 (2007) 774-780
15. In: Bunshah R.F. (Ed). Handbook of hard coatings: deposition technologies, properties and applications (2001), Noyes Publications, Park Ridge
16. Sakaki M., and Sakakibara T. Excitation, ionization, and reaction mechanism of a reactive cathodic arc deposition of TiN. IEEE Trans Plasma Sci 22 (1994) 1049-1054
17. 2 films. Wear 114 (1987) 263-274
18. 2-Ti composite films. Appl Surf Sci 253 (2007) 4415-4419
19. x films prepared by pulsed magnetron sputtering. Surf Coat Technol 131 (2000) 216-221
20. Valvoda V., Kuzel Jr. R., and Musil R.C. Structure of TiN coatings deposited at relatively high rates and low temperatures by magnetron sputtering. Thin Solid Films 156 (1988) 53-64
21. Ulrich S., Ziebert C., Stüber M., Nold E., Holleck H., Göken M., et al. Correlation between constitution, properties and machining performance of TiN/ZrN multilayers. Surf Coat Technol 188-189 (2004) 331-337
22. 2/titanium composite coatings with different titanium content. Surf Coat Technol 201 (2007) 5290-5293
23. y. Surf Coat Technol 86 (1996) 372-376
24. Harris G.B. Quantitative measurement of preferred orientation in rolled uranium bars. Philos Mag 43 (1952) 113-123
25. Huang J.H., Tsai Y.P., and Yu G.P. Effect of processing parameters on the microstructure and mechanical properties of TiN film on stainless steel by HCD ion plating. Thin Solid Films 355-356 (1999) 440-445
26. Patsalas P., Charitidis C., and Logothetidis S. The effect of substrate temperature and biasing on the mechanical properties and structure of sputtered titanium nitride thin films. Surf Coat Technol 125 (2000) 335-340
27. Iordanova I., Kelly P.J., Mirchev R., and Antonov V. Crystallography of magnetron sputtered TiN coatings on steel substrates. Vacuum 81 (2007) 830-842
28. Vaz F., Machado P., Rebouta L., Cerqueira P., Goudeau P., Rivière J.P., et al. Mechanical characterization of reactively magnetron-sputtered TiN films. Surf Coat Technol 174-175 (2000) 375-382
29. x)N superhard nanocomposite coatings reaching the hardness of diamond. Surf Coat Technol 120-121 (1999) 173-178
30. Hultman L., Munz W.D., Musil J., Kadlec S., Petrov I., and Greene J.E. Low-energy (∼100 eV) ion irradiation during growth of TiN deposited by reactive magnetron sputtering: Effects of ion flux on film microstructure. J Vac Sci Technol A 9 (1991) 434-438
31. Lee J.W., Tien S.K., and Kuo Y.C. The effects of pulse frequency and substrate bias to the mechanical properties of CrN coatings deposited by pulsed DC magnetron sputtering. Thin Solid Films 494 (2006) 161-167
32. Bull S.J. Failure modes in scratch adhesion testing. Surf Coat Technol 50 (1991) 25-32