Characteristics of triode magnetron sputtering: The morphology of deposited titanium films

Surface and Coatings Technology

Volumn 107, Issue 1, 1998, Pages 24-30

  Fontana, L C ^a   Muzart, J L R ^b  

^a SANTA CATARINA STATE UNIVERSITY   (Brazil)

^b LABMAT   (Brazil)

Author keywords

Titanium films; Triode magnetron sputtering

Indexed keywords

CARRIER CONCENTRATION; METALLIC FILMS; MORPHOLOGY; TITANIUM; TRIODES;

TITANIUM FILMS; TRIODE MAGNETRON SPUTTERING;

MAGNETRON SPUTTERING;

EID: 0032131712     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(98)00576-3     Document Type: Article

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