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Volumn 204, Issue 21-22, 2010, Pages 3684-3697

Effect of target frequency, bias voltage and bias frequency on microstructure and mechanical properties of pulsed DC CFUBM sputtered TiN coating

Author keywords

Bias frequency; Bias voltage; CFUBMS; Pulsed DC; Target frequency; TiN

Indexed keywords

BIAS FREQUENCY; CFUBMS; CLOSED-FIELD UNBALANCED MAGNETRON SPUTTERING; COATING MICROSTRUCTURES; COATING QUALITY; COMPOSITE MICROHARDNESS; DEPTH PROFILE; FIELD EMISSION SCANNING ELECTRON MICROSCOPY; GRAZING-INCIDENCE X-RAY DIFFRACTION; HARDNESS TEST; HIGH-SPEED STEELS; INTER-DIFFUSION; ION CURRENTS; ION ETCHING; MICROSTRUCTURE AND MECHANICAL PROPERTIES; NEGATIVE BIAS; PROCESS PARAMETERS; PROCESS STABILITY; PULSED DC; PULSED MAGNETRON SPUTTERING; SCRATCH ADHESION TESTS; TARGET FREQUENCIES; TIN COATING; VICKERS MICROHARDNESS TESTS;

EID: 77953692023     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.04.047     Document Type: Article
Times cited : (33)

References (36)
  • 32
    • 1842427357 scopus 로고    scopus 로고
    • Sci. Technol. A 22 (2) 260.
    • J.W. Lee, J.J. Cuomo, J. Vac. Sci. Technol. A 22 (2) 260.
    • Lee J.W1    Cuomo J.J2    Vac, J.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.