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Volumn 204, Issue 21-22, 2010, Pages 3684-3697
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Effect of target frequency, bias voltage and bias frequency on microstructure and mechanical properties of pulsed DC CFUBM sputtered TiN coating
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Author keywords
Bias frequency; Bias voltage; CFUBMS; Pulsed DC; Target frequency; TiN
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Indexed keywords
BIAS FREQUENCY;
CFUBMS;
CLOSED-FIELD UNBALANCED MAGNETRON SPUTTERING;
COATING MICROSTRUCTURES;
COATING QUALITY;
COMPOSITE MICROHARDNESS;
DEPTH PROFILE;
FIELD EMISSION SCANNING ELECTRON MICROSCOPY;
GRAZING-INCIDENCE X-RAY DIFFRACTION;
HARDNESS TEST;
HIGH-SPEED STEELS;
INTER-DIFFUSION;
ION CURRENTS;
ION ETCHING;
MICROSTRUCTURE AND MECHANICAL PROPERTIES;
NEGATIVE BIAS;
PROCESS PARAMETERS;
PROCESS STABILITY;
PULSED DC;
PULSED MAGNETRON SPUTTERING;
SCRATCH ADHESION TESTS;
TARGET FREQUENCIES;
TIN COATING;
VICKERS MICROHARDNESS TESTS;
ADHESION;
BIAS VOLTAGE;
DC POWER TRANSMISSION;
DIFFUSION COATINGS;
HARDNESS TESTING;
IONS;
MECHANICAL PROPERTIES;
MICROHARDNESS;
MICROSTRUCTURE;
PLASMA DENSITY;
PLASMA STABILITY;
SCANNING ELECTRON MICROSCOPY;
SECONDARY ION MASS SPECTROMETRY;
TARGETS;
TITANIUM NITRIDE;
X RAY DIFFRACTION;
HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;
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EID: 77953692023
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2010.04.047 Document Type: Article |
Times cited : (33)
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References (36)
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