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Volumn 174-175, Issue , 2003, Pages 375-382

Mechanical characterization of reactively magnetron-sputtered TiN films

Author keywords

Ion bombardment; R.f. power; Stress state; TiN phase

Indexed keywords

ADHESION; ARGON; COMPRESSIVE STRESS; CRACKS; ELECTRIC POTENTIAL; GRAIN SIZE AND SHAPE; HARDNESS; ION BOMBARDMENT; MAGNETRON SPUTTERING; NITROGEN; RESIDUAL STRESSES; STRESS RELAXATION; TEXTURES; TITANIUM NITRIDE; X RAY DIFFRACTION ANALYSIS;

EID: 18244425771     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00711-4     Document Type: Article
Times cited : (51)

References (38)
  • 19
    • 0036146472 scopus 로고    scopus 로고
    • for detailed information on the procedure see:
    • for detailed information on the procedure see: Vaz F. Rebouta L. Goudeau P. et al. Thin Solid Films 402 2002 195
    • (2002) Thin Solid Films , vol.402 , pp. 195
    • Vaz, F.1    Rebouta, L.2    Goudeau, P.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.