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Volumn 174-175, Issue , 2003, Pages 375-382
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Mechanical characterization of reactively magnetron-sputtered TiN films
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Author keywords
Ion bombardment; R.f. power; Stress state; TiN phase
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Indexed keywords
ADHESION;
ARGON;
COMPRESSIVE STRESS;
CRACKS;
ELECTRIC POTENTIAL;
GRAIN SIZE AND SHAPE;
HARDNESS;
ION BOMBARDMENT;
MAGNETRON SPUTTERING;
NITROGEN;
RESIDUAL STRESSES;
STRESS RELAXATION;
TEXTURES;
TITANIUM NITRIDE;
X RAY DIFFRACTION ANALYSIS;
INTERNAL CRACKS;
COATINGS;
COATING;
INDUSTRIAL APPLICATION;
PLASMA;
SURFACE PROPERTY;
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EID: 18244425771
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/S0257-8972(03)00711-4 Document Type: Article |
Times cited : (51)
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References (38)
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