Elastically strain-sharing Si(110) nanomembranes

ECS Transactions

Volumn 33, Issue 6, 2010, Pages 813-821

  Paskiewicz, Deborah M ^a   Scott, Shelley A ^a   Savage, Donald E ^a   Lagally, Max G ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; GERMANIUM COMPOUNDS; MOLECULAR BEAM EPITAXY; NANOSTRUCTURES; SILICON ON INSULATOR TECHNOLOGY; TEMPERATURE;

ELASTIC STRAIN; ELASTIC STRAIN ENGINEERINGS; ELASTIC STRAIN RELAXATION; LOW GROWTH TEMPERATURE; LOW TEMPERATURE MOLECULAR BEAM EPITAXY; SELECTIVE ETCHING; SILICON-ON- INSULATORS (SOI); TRILAYER STRUCTURE;

SI-GE ALLOYS;

EID: 79952680733     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3487611     Document Type: Conference Paper

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