Challenges in epitaxial growth of SiGe buffers on Si (111), (110), and (112)

Thin Solid Films

Volumn 508, Issue 1-2, 2006, Pages 136-139

  Lee, Minjoo L ^a   Antoniadis, Dimitri A ^a   Fitzgerald, Eugene A ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DISLOCATIONS (CRYSTALS); NUCLEATION; STACKING FAULTS; THIN FILMS; VLSI CIRCUITS;

BUFFERS; MICROTWINS; SHOCKLEY PARTIAL DISLOCATIONS;

EPITAXIAL GROWTH;

EID: 33646117503     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.328     Document Type: Article

References (16)

1. Takagi S.-i., Toriumi A., Iwase M., and Tango H. IEEE Trans. Electron Devices 41 (1994) 2363
2. Hull R., and Bean J.C. Crit. Rev. Solid State Mater. Sci. 17 (1992) 507
3. Yang M., Gusev E.P., Ieong M., Gluschenkov O., Boyd D.C., Chan K.K., Kozlowski P.M., D'Emic C.P., Sicina R.M., Jamison P.C., and Chou A.I. IEEE Electron Device Lett. 24 (2003) 339
4. Takagi S. Symposium on VLSI Technology Digest of Technical Papers (2003) 115
5. Low T., Li M.F., Shen C., Yeo Y.-C., Hou Y.T., Zhu C., Chin A., and Kwong D.L. Appl. Phys. Lett. 85 (2004) 2402
6. Thompson S., Anand N., Armstrong M., Auth C., Arcot B., Alavi M., Bai P., Bielfeld J., Bigwood R., Brandenburg J., Buehler M., Cea S., Chikarmane V., Choi C., Frankovic R., Ghani T., Glass G., Han W., Hoffmann T., Hussein M., Jacob P., Jain A., Jan C., Joshi S., Kenyon C., Klaus J., Klopcic S., Luce J., Ma Z., Mcintyre B., Mistry K., Murthy A., Nguyen P., Pearson H., Sandford T., Schweinfurth R., Shaheed R., Sivakumar S., Taylor M., Tufts B., Wallace C., Wang P., Weber C., and Bohr M. Technical Digest-International Electron Devices Meeting, San Francisco, CA (2002) 61
7. Lee M.L., Fitzgerald E.A., Bulsara M.T., Currie M.T., and Lochtefeld A. J. Appl. Phys. 97 (2005) 011101
8. Leitz C.W., Currie M.T., Kim A.Y., Lai J., Robbins E., and Fitzgerald E.A. J. Appl. Phys. 90 (2001) 2730
9. Kvam E.P., and Hull R. J. Appl. Phys. 73 (1993) 7407
10. Fitzgerald E.A. Mater. Sci. Rep. 7 (1991) 87
11. Okada M., Kondo M., Ikeda H., Zaima S., and Yasuda Y. Jpn. J. Appl. Phys. Part 1 36 (1997) 7665
12. Hibino H. Mater. Res. Soc. Symp. Proc. 584 (1999) 77
13. Ronda A., Berbezier I., Pascale A., Portavoce A., and Volpi F. Mater. Sci. Eng., B, Solid-State Mater. Adv. Technol. 101 (2003) 95
14. Wagner G. Cryst. Res. Technol. 33 (1998) 383
15. Wegscheider W., Eberl K., Abstreiter G., Cerva H., and Oppolzer H. Appl. Phys. Lett. 57 (1990) 1496
16. Abrahams M.S., Weisberg L.R., Buiocchi C.J., and Blanc J. J. Mater. Sci. 4 (1969) 223