Growth temperature dependence of the crystalline morphology of SiGe films grown on Si(110) substrates with compositionally step-graded buffer

Thin Solid Films

Volumn 517, Issue 1, 2008, Pages 235-238

  Arimoto, Keisuke ^a   Watanabe, Masato ^a   Yamanaka, Junji ^a   Nakagawa, Kiyokazu ^a   Sawano, Kentarou ^b   Shiraki, Yasuhiro ^b   Usami, Noritaka ^c   Nakajima, Kazuo ^c  

^a UNIVERSITY OF YAMANASHI   (Japan)

^b TOKYO CITY UNIVERSITY   (Japan)

^c TOHOKU UNIVERSITY   (Japan)

Author keywords

110; Molecular beam epitaxy; SiGe

Indexed keywords

CRYSTAL GROWTH; EPITAXIAL GROWTH; HETEROJUNCTIONS; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; MOLECULAR DYNAMICS; SEMICONDUCTING GERMANIUM COMPOUNDS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR QUANTUM WIRES; SILICON; SILICON ALLOYS; SUBSTRATES;

110; CRYSTALLINE MORPHOLOGIES; DIFFERENT SUBSTRATES; GRADED BUFFERS; HETEROSTRUCTURES; MOLECULAR-BEAM EPITAXIES; SI(110); SIGE; SIGE FILMS; SUBSTRATE TEMPERATURES; TEMPERATURE DEPENDENCES;

GAS SOURCE MOLECULAR BEAM EPITAXY;

EID: 54849412057     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.08.130     Document Type: Article

References (9)

1. Mizuno T., Sugiyama N., Tezuka T., Moriyama Y., Nakaharai S., and Takagi S. Symp. VLSI Tech. (2003) 97
2. Mizuno T., Sugiyama N., Tezuka T., Moriyama Y., Nakaharai S., and Takagi S. IEDM Tech. Dig. (2003) 809
3. Tsutsui G., Saitoh M., and Hiramoto T. IEEE Electron Device Lett. 26 (2005) 836
4. Hull R., Bean J.C., Peticolas L., and Bahnck D. Appl. Phys. Lett. 59 (1991) 964
5. Arimoto K., Yamanaka J., Nakagawa K., Sawano K., Shiraki Y., Koh S., and Usami N. Thin Solid Films 508 (2006) 132
6. Elfving A., Zhao M., Hansson G.V., and Ni W.X. Appl. Phys. Lett. 89 (2006) 181901
7. Lee M.L., Antoniadis D.A., and Fitzgerald E.A. Thin Solid Films 508 (2006) 136
8. Sugiyama N., Hirashita N., Mizuno T., Miyamura Y., Moriyama Y., Toyoda E., Nakaharai S., Tezuka T., Usuda K., and Takagi S. 3rd International Workshop on New Group IV Semiconductors (2004)
9. Arimoto K., Yamanaka J., Nakagawa K., Sawano K., Shiraki Y., Usami N., and Nakajima K. J. Cryst. Growth 301-302 (2007) 343