Influences on ionization fraction in an inductively coupled ionized physical vapor deposition device plasma

Journal of Applied Physics

Volumn 91, Issue 2, 2002, Pages 605-612

  Juliano, Daniel R ^a   Ruzic, David N ^a   Allain, Monica M C ^a   Hayden, Douglas B ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BACKGROUND GAS; EXPERIMENTAL SYSTEM; INDUCTIVELY-COUPLED; IONIZATION FRACTIONS; IONIZED PHYSICAL VAPOR DEPOSITION; LANGMUIR PROBE MEASUREMENTS; METAL ATOMS; MONTE CARLO; PLASMA CONDITIONS; PLASMA PARAMETER; SPUTTERED ATOMS;

COMPUTER SIMULATION; ELECTROMAGNETIC INDUCTION; EXPERIMENTS; HEATING; IONIZATION OF GASES; PHYSICAL VAPOR DEPOSITION; VAPORS;

MONTE CARLO METHODS;

EID: 0037080897     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1425447     Document Type: Article

References (18)

1. W. Holber, J. S. Logan, H. J. Grabarz, J. T. C. Yeh, J. B. O. Caughman, A. Sugarman, and F. E. Turene, J. Vac. Sci. Technol. A 11, 2903 (1993).
2. M. Yamashita, J. Vac. Sci. Technol. A 7, 151 (1989).
3. S. M. Rossnagel and J. Hopwood, J. Vac. Sci. Technol. B 12, 449 (1994).
4. S. M. Rossnagel, Appl. Phys. Lett. 63, 3285 (1993).
5. P. F. Cheng, S. M. Rossnagel, and D. N. Ruzic, J. Vac. Sci. Technol. B 13, 203 (1995).
6. S. M. Rossnagel, J. Vac. Sci. Technol. A 16, 2585 (1998).
7. G. A. Bird, Molecular Gas Dynamics and the Direct Simulation of Gas Flows (Wiley, New York, 1964).
8. D. R. Juliano, Ph.D. thesis, University of Illinois-Urbana, 2000.
9. K. M. Green, D. B. Hayden, D. R. Juliano, and D. N. Ruzic, Rev. Sci. Instrum. 68, 4555 (1997).
10. D. B. Hayden, D. R. Juliano, K. M. Green, D. N. Ruzic, C. A. Weiss, K. A. Ashtiani, and T. J. Licata, J. Vac. Sci. Technol. A 16, 624 (1998).
11. D. B. Hayden, Ph.D. thesis, University of Illinois-Urbana, 1999.
12. P. Sigmund, Phys. Rev. 184, 383 (1969).
13. M. W. Thompson, Philos. Mag. 18, 337 (1968).
14. M. A. Shaheen and D. N. Ruzic, J. Vac. Sci. Technol. A 11, 3085 (1993).
15. J. F. Ziegler, J. P. Biersack, and U. Littmark, in Stopping and Ranges of Ions in Matter (Pergamon, New York, 1985), Vol. 1, pp. 24-48.
16. M. J. Grapperhaus, Z. Krivokapic, and M. J. Kushner, J. Appl. Phys. 83, 35 (1998).
17. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharge and Materials Processing (Wiley, New York, 1994).
18. M. Dickson, F. Qian, and J. Hopwood, J. Vac. Sci. Technol. A 15, 340 (1997).