Nanophotonic integration in state-of-the-art CMOS foundries

Optics Express

Volumn 19, Issue 3, 2011, Pages 2335-2346

  Orcutt, Jason S ^a,b   Khilo, Anatol ^a   Holzwarth, Charles W ^a,d   Popovic, Milos A ^a,e   Li, Hanqing ^b   Sun, Jie ^a   Bonifield, Thomas ^c   Hollingsworth, Randy ^c   Kärtner, Franz X ^a   Smith, Henry I ^a   Stojanovic, Vladimir ^a,b   Ram, Rajeev J ^a,b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b Massachusetts Institute of Technology Cambridge   (United States)

^c TEXAS INSTRUMENTS   (United States)

^d UNIVERSITY OF CANTERBURY   (New Zealand)

^e UCB 450   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BONDING; CMOS INTEGRATED CIRCUITS; FABRICATION; FOUNDRY PRACTICE; MICROWAVE FILTERS; NANOPHOTONICS; WAFER BONDING;

CMOS PROCESSS; HIGH-DENSITY; HIGH-THROUGHPUT; INCREMENTAL COST; LOW INSERTION LOSS; MICRORINGS; NANOPHOTONIC DEVICES; PHOTONIC INTEGRATIONS; POST-FABRICATION; POST-PROCESSING TECHNOLOGIES; PROCESS FLOWS; RESONATOR FILTERS; SECOND ORDERS;

FILTER BANKS;

ARTICLE; COMPUTER AIDED DESIGN; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; MICROELECTROMECHANICAL SYSTEM; NANOTECHNOLOGY; PHOTON; REFRACTOMETRY; SEMICONDUCTOR; SYSTEM ANALYSIS;

COMPUTER-AIDED DESIGN; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; MICRO-ELECTRICAL-MECHANICAL SYSTEMS; NANOTECHNOLOGY; PHOTONS; REFRACTOMETRY; SEMICONDUCTORS; SYSTEMS INTEGRATION;

EID: 79851485104     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.19.002335     Document Type: Article

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