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Volumn 16, Issue 5, 2004, Pages 1328-1330

Low-loss SOI photonic wires and ring resonators fabricated with deep UV lithography

Author keywords

High index contrast; Photonic wire; Ring resonators; Silicon on insulator (SOI) technology

Indexed keywords

CROSSTALK; DRY ETCHING; ELECTROMAGNETIC WAVE POLARIZATION; OPTICAL WAVEGUIDES; PHOTOLITHOGRAPHY; REFRACTIVE INDEX; RESONATORS; SEMICONDUCTING SILICON; SILICON ON INSULATOR TECHNOLOGY;

EID: 2442543204     PISSN: 10411135     EISSN: None     Source Type: Journal    
DOI: 10.1109/LPT.2004.826025     Document Type: Article
Times cited : (430)

References (8)
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  • 3
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    • (2002) IEEE J. Select. Topics Quantum Electron. , vol.8 , pp. 928-934
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  • 7
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    • Analysis of line edge roughness using probability process model for chemically amplified resists
    • June
    • H. Fukuda, "Analysis of line edge roughness using probability process model for chemically amplified resists," Jpn. J. Appl. Phys., vol. 42, no. 6B, pp. 3748-3754, June 2003.
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  • 8
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    • Asymmetrically coupled Silicon-on-insulator microring resonators for compact add-drop multiplexers
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.