Fabrication of photonic wire and crystal circuits in silicon-on-insulator using 193-nm optical lithography

Journal of Lightwave Technology

Volumn 27, Issue 18, 2009, Pages 4076-4083

  Selvaraja, Shankar Kumar ^a   Jaenen, Patrick ^b   Bogaerts, Wim ^a   Van Thourhout, Dries ^a   Dumon, Pieter ^a   Baets, Roel ^a  

^a GHENT UNIVERSITY   (Belgium)

^b IMEC   (Belgium)

Author keywords

Nonophotonics; Photonic crystal; Silicon on insulator (SOI); Waveguides

Indexed keywords

BENDING LOSS; COMPLEMENTARY METAL OXIDE SEMICONDUCTORS; CRYSTAL CIRCUITS; DRY ETCH PROCESS; FABRICATION PROCESS; HIGH INDEX CONTRAST; HIGH RESOLUTION; IN-PROCESS; MASS PRODUCTION; NONOPHOTONICS; OPTICAL LITHOGRAPHY; PHOTONIC CIRCUITS; PHOTONIC INTEGRATED CIRCUITS; PHOTONIC WIRES; PROPAGATION LOSS; PROXIMITY EFFECTS; SILICON ON INSULATOR; SILICON-ON-INSULATOR (SOI);

DRY ETCHING; FABRICATION; INTEGRATED CIRCUITS; INTEGRATED OPTOELECTRONICS; MICROSENSORS; OPTICAL WAVEGUIDES; PHOTOLITHOGRAPHY; PHOTONIC CRYSTALS; PLASMA ETCHING; SEMICONDUCTING SILICON; WAVEGUIDES; WIRE;

SILICON ON INSULATOR TECHNOLOGY;

EID: 69849110033     PISSN: 07338724     EISSN: None     Source Type: Journal    
DOI: 10.1109/JLT.2009.2022282     Document Type: Article

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