Patterning the mechanical properties of hydrogen silsesquioxane films using electron beam irradiation for application in mechano cell guidance

Thin Solid Films

Volumn 519, Issue 6, 2011, Pages 2003-2010

  Lanniel, Mathieu ^a   Lu, Bingrui ^b   Chen, Yifang ^b   Allen, Stephanie ^a   Buttery, Lee ^a   Williams, Phil ^a   Huq, Ejaz ^b   Alexander, Morgan ^a  

^a UNIVERSITY OF NOTTINGHAM   (United Kingdom)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

Atomic force microscopy; Electron beam curing; Hydrogen silsesquioxane; Mesenchymal stem cells; Plasma polymerization

Indexed keywords

ALLYL AMINE; ATOMIC FORCE; CELL GUIDANCE; ELECTRON BEAM IRRADIATION; ELECTRON-BEAM CURING; ELECTRON-BEAM EXPOSURE; HUMAN MESENCHYMAL STEM CELLS; HYDROGEN SILSESQUIOXANE; MESENCHYMAL STEM CELL; STEM CELL DIFFERENTIATION; STIFFNESS VALUES; SURFACE COATINGS; SURFACE STIFFNESS; TRIMETHYLAMINE;

ADHESION; ATOMIC FORCE MICROSCOPY; BIOMECHANICS; CELL ADHESION; CELL CULTURE; COATINGS; CURING; ELECTRON BEAMS; ELECTRON OPTICS; ELECTRONS; HYDROGEN; MECHANICAL PROPERTIES; PLASMA POLYMERIZATION; POLYMERS; STEM CELLS; STIFFNESS; SURFACE ROUGHNESS; SURFACES; THERMOANALYSIS;

ELECTRON BEAM LITHOGRAPHY;

EID: 78651234217     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.10.054     Document Type: Article

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