Time-dependent exposure dose of hydrogen silsesquioxane when used as a negative electron-beam resist

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 6, 2006, Pages 3073-3076

  Clark, Nathaniel ^a   Vanderslice, Amy ^a   Grove III, Robert ^a   Krchnavek, Robert R ^a  

^a ROWAN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DOSIMETRY; ELECTRON BEAMS; OPTICAL RESOLVING POWER; VACUUM;

ELECTRON BEAM RESIST; EXPOSURE DOSE; HYDROGEN SILSESQUIOXANE (HSQ);

PARAFFINS;

EID: 33845263941     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2366697     Document Type: Article

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