Thermal treatment effects on N-alkyl perylene diimide thin-film transistors with different alkyl chain

Journal of Applied Physics

Volumn 108, Issue 12, 2010, Pages

  Jeon, Hyeon Gu ^a   Hattori, Jinya ^a   Kato, Shimpei ^a   Oguma, Naomi ^b   Hirata, Naoki ^b   Taniguchi, Yoshio ^a   Ichikawa, Musubu ^a,c  

^a SHINSHU UNIVERSITY   (Japan)

^b Dainichiseika Color & Chemicals Mfg Co Ltd   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALKYL CHAIN; ALKYL CHAIN LENGTHS; EXTERNAL ELECTRIC FIELD; MOLECULAR MIGRATION; MOLECULAR MOVEMENT; MOLECULAR REARRANGEMENT; OCTADECYL; PERYLENEDIIMIDES; PERYLENES; THERMAL TREATMENT; UPPER LAYER;

ALKYLATION; CHAIN LENGTH; ELECTRIC FIELDS; ELECTRON MOBILITY; GRAIN SIZE AND SHAPE; HEAT TREATMENT; THIN FILM TRANSISTORS;

GRAIN GROWTH;

EID: 78650858124     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3525997     Document Type: Article

References (60)

1. Organic Electronics: Materials, Manufacturing and Applications, edited by, H. Klauk, (Wiley-VCH, Weinheim, Germany, 2006).
2. Physical and Chemical Aspects of Organic Electronics: From Fundamentals to Functional Devices, edited by, C. Wöll, (Wiley-VCH, Weinheim, Germany, 2009).
3. D. Braga and G. Horowitz, Adv. Mater. 0935-9648 21, 1473 (2009). 10.1002/adma.200802733
4. R. A. Street, Adv. Mater. 0935-9648 21, 2007 (2009). 10.1002/adma. 200803211
5. M. Burghard, H. Klauk, and K. Kern, Adv. Mater. 0935-9648 21, 2586 (2009). 10.1002/adma.200803582
6. M. E. Roberts, A. N. Sokolov, and Z. Bao, J. Mater. Chem. 0959-9428 19, 3351 (2009). 10.1039/b816386c
7. M. Mas-Torrent and C. Rovira, Chem. Soc. Rev. 0306-0012 37, 827 (2008). 10.1039/b614393h
8. A. R. Murphy and J. M. J. Fŕchet, Chem. Rev. 0009-2665 107, 1066 (2007). 10.1021/cr0501386 (Pubitemid 46736534)
9. M. Muccini, Nature Mater. 1476-1122 5, 605 (2006). 10.1038/nmat1699 (Pubitemid 44157676)
10. A. Dodabalapur, Mater. Today 1369-7021 9, 24 (2006). 10.1016/S1369- 7021(06)71444-4
11. H. Sirringhaus, Adv. Mater. 0935-9648 17, 2411 (2005). 10.1002/adma.200501152 (Pubitemid 41504967)
12. A. Facchetti, M. -H. Yoon, and T. J. Marks, Adv. Mater. 0935-9648 17, 1705 (2005). 10.1002/adma.200500517 (Pubitemid 41055422)
13. H. E. Katz, Chem. Mater. 0897-4756 16, 4748 (2004). 10.1021/cm049781j
14. J. Zaumseil and H. Sirringhaus, Chem. Rev. 0009-2665 107, 1296 (2007). 10.1021/cr0501543 (Pubitemid 46736540)
15. A. Facchetti, Mater. Today 1369-7021 10, 28 (2007). 10.1016/S1369- 7021(07)70017-2 (Pubitemid 46329550)
16. C. R. Newman, C. D. Frisbie, D. A. da Silva Filho, J. -L. Bŕdas, P. C. Ewbank, and K. R. Mann, Chem. Mater. 0897-4756 16, 4436 (2004). 10.1021/cm049391x
17. C. D. Dimitrakopoulos and P. R. L. Malenfant, Adv. Mater. 0935-9648 14, 99 (2002). 10.1002/1521-4095(20020116)14:2<99::AID-ADMA993.0.CO;2-9
18. A. Dodabalapur, Nature (London) 0028-0836 434, 151 (2005). 10.1038/434151a
19. H. E. Katz, A. J. Lovinger, J. Johnson, C. Kloc, T. Siegrist, W. Li, Y. -Y. Lin, and A. Dodabalapur, Nature (London) 0028-0836 404, 478 (2000). 10.1038/35006603 (Pubitemid 30186885)
20. L. -L. Chua, J. Zaumseil, J. -F. Chang, E. C.-W. Ou, P. K.-H. Ho, H. Sirringhaus, and R. H. Friend, Nature (London) 0028-0836 434, 194 (2005). 10.1038/nature03376 (Pubitemid 40388045)
21. M. L. Tang, J. H. Oh, A. D. Reichardt, and Z. Bao, J. Am. Chem. Soc. 0002-7863 131, 3733 (2009). 10.1021/ja809045s
22. M. -H. Yoon, S. A. DiBenedetto, M. T. Russell, A. Facchetti, and T. J. Marks, Chem. Mater. 0897-4756 19, 4864 (2007). 10.1021/cm071230g (Pubitemid 47582988)
23. D. Kumaki, S. Ando, S. Shimono, Y. Yamashita, T. Umeda, and S. Tokito, Appl. Phys. Lett. 0003-6951 90, 053506 (2007). 10.1063/1.2436641
24. B. A. Jones, A. Facchetti, M. R. Wasielewski, and T. J. Marks, J. Am. Chem. Soc. 0002-7863 129, 15259 (2007). 10.1021/ja075242e (Pubitemid 350247810)
25. T. Jung, B. Yoo, L. Wang, A. Dodabalapur, B. A. Jones, A. Facchetti, M. R. Wasielewski, and T. J. Marks, Appl. Phys. Lett. 0003-6951 88, 183102 (2006). 10.1063/1.2200591
26. G. Horowitz, F. Kouki, P. Spearman, D. Fichou, C. Nogues, X. Pan, and F. Garnier, Adv. Mater. 0935-9648 8, 242 (1996). 10.1002/adma.19960080312
27. P. R. L. Malenfant, C. D. Dimitrakopoulus, J. D. Gelorme, L. L. Kosbar, and T. O. Graham, Appl. Phys. Lett. 0003-6951 80, 2517 (2002). 10.1063/1.1467706 (Pubitemid 34474324)
28. B. A. Jones, M. J. Ahrens, M. -H. Yoon, A. Facchetti, T. J. Marks, and M. R. Wasielewski, Angew. Chem., Int. Ed. 1433-7851 43, 6363 (2004). 10.1002/anie.200461324 (Pubitemid 40029473)
29. R. J. Chesterfield, J. C. McKeen, C. R. Newman, P. C. Ewbank, D. A. da Silva Filho, J. -L. Bŕdas, L. L. Miller, K. R. Mann, and C. D. Frisbie, J. Phys. Chem. B 1089-5647 108, 19281 (2004). 10.1021/jp046246y (Pubitemid 40015685)
30. R. J. Chesterfield, J. C. McKeen, C. R. Newman, and C. D. Frisbie, J. Appl. Phys. 0021-8979 95, 6396 (2004). 10.1063/1.1710729
31. D. J. Gundlach, K. P. Pernstich, G. Wilckens, M. Grüter, S. Haas, and B. Batlogg, J. Appl. Phys. 0021-8979 98, 064502 (2005). 10.1063/1.2043256 (Pubitemid 41415357)
32. B. Yoo, T. Jung, D. Basu, and A. Dodabalapur, Appl. Phys. Lett. 0003-6951 88, 082104 (2006). 10.1063/1.2177627
33. R. Schmidt, M. M. Ling, J. H. Oh, M. Winkler, M. Könemann, Z. Bao, and F. Würthner, Adv. Mater. 0935-9648 19, 3692 (2007). 10.1002/adma.200701478 (Pubitemid 350134627)
34. J. H. Oh, S. Liu, and Z. Bao, Appl. Phys. Lett. 0003-6951 91, 212107 (2007). 10.1063/1.2803073 (Pubitemid 350159045)
35. Y. Hosoi, D. Tsunami, H. Ishii, and Y. Furukawa, Chem. Phys. Lett. 0009-2614 436, 139 (2007). 10.1016/j.cplett.2006.12.106 (Pubitemid 46216978)
36. H. Z. Chen, M. M. Ling, X. Mo, M. M. Shi, M. Wang, and Z. Bao, Chem. Mater. 0897-4756 19, 816 (2007). 10.1021/cm062352w (Pubitemid 46408950)
37. B. A. Jones, A. Facchetti, M. R. Wasielewski, and T. J. Marks, Adv. Funct. Mater. 1616-301X 18, 1329 (2008). 10.1002/adfm.200701045 (Pubitemid 351652829)
38. S. H. Han, K. J. Lee, S. H. Lee, and J. Jang, J. Non-Cryst. Solids 0022-3093 354, 2870 (2008). 10.1016/j.jnoncrysol.2007.09.100
39. Y. Wen, Y. Liu, C. Di, Y. Wang, X. Sun, Y. Guo, J. Zheng, W. Wu, W. Ye, and G. Yu, Adv. Mater. 0935-9648 21, 1631 (2009). 10.1002/adma.200802934
40. A. M. Ramil, Th. B. Singh, N. T. Haber, N. Marjanovic, S. Günes, A. Andreev, G. J. Matt, R. Resel, H. Sitter, and S. Sariciftci, J. Cryst. Growth 0022-0248 288, 123 (2006). 10.1016/j.jcrysgro.2005.12.061 (Pubitemid 43172162)
41. Z. Bao, A. J. Lovinger, and A. Dodabalapur, Appl. Phys. Lett. 0003-6951 69, 3066 (1996). 10.1063/1.116841
42. H. G., Laquindanum, H. E. Katz, and A. J. Lovinger, J. Am. Chem. Soc. 0002-7863 120, 664 (1998). 10.1021/ja9728381 (Pubitemid 28081943)
43. R. Schmidt, J. H. Oh, Y. -S. Sun, M. Deppisch, A. -M. Krause, K. Radacki, H. Braunschweig, M. Könemann, P. Erk, Z. Bao, and F. Würthner, J. Am. Chem. Soc. 0002-7863 131, 6215 (2009). 10.1021/ja901077a
44. A. Facchetti, Y. Deng, A. Wang, Y. Koide, H. Sirringhaus, T. J. Marks, and R. H. Friend, Angew. Chem., Int. Ed. 1433-7851 39, 4547 (2000). 10.1002/1521-3773(20001215)39:24<4547::AID-ANIE45473.0.CO;2-J
45. P. C. Chang, J. Lee, D. Huang, V. Subramanian, A. R. Murphy, and J. M. J. Fŕchet, Chem. Mater. 0897-4756 16, 4783 (2004). 10.1021/cm0496570
46. C. Piliego, D. Jarzab, G. Gigli, Z. Chen, A. Facchetti, and M. A. Loi, Adv. Mater. 0935-9648 21, 1573 (2009). 10.1002/adma.200803207
47. A. Zen, A. Bilge, F. Gabbrecht, R. Alle, K. Meerholz, J. Grenzer, D. Neher, U. Scherf, and T. Farrell, J. Am. Chem. Soc. 0002-7863 128, 3914 (2006). 10.1021/ja0573357
48. F. Dinelli, M. Murgia, F. Biscarini, and D. M. DeLeeuw, Synth. Met. 0379-6779 146, 373 (2004). 10.1016/j.synthmet.2004.08.016
49. R. Ben Chaabane, A. Ltaief, C. Dridi, H. Rahmouni, A. Bouazizi, and H. Ben Ouada, Thin Solid Films 0040-6090 427, 371 (2003). 10.1016/S0040-6090(02) 01242-7
50. Q. Bao, J. Li, C. M. Li, Z. L. Dong, Z. Lu, F. Qin, C. Gong, and J. Guo, J. Phys. Chem. B 1089-5647 112, 12270 (2008). 10.1021/jp804988h
51. G. Scavia, W. Porzio, S. Destri, L. Barba, G. Arrighetti, S. Milita, L. Fumagalli, D. Natali, and M. Sampietro, Surf. Sci. 0039-6028 602, 3106 (2008). 10.1016/j.susc.2008.08.009
52. S. Tatemichi, M. Ichikawa, T. Koyama, and Y. Taniguchi, Appl. Phys. Lett. 0003-6951 89, 112108 (2006). 10.1063/1.2349290 (Pubitemid 44396579)
53. S. Demmig and H. Langhals, Chem. Ber. 0009-2940 121, 225 (1988). 10.1002/cber.19881210205
54. C. W. Struijk, A. B. Sieval, J. E. J. Dakhorst, M. van Dijk, P. Kimkes, R. B. M. Koehorst, H. Donker, T. J. Schaafsma, S. J. Picken, A. M. van de Craats, J. M. Warman, H. Zuilhof, and E. J. R. Sudhölter, J. Am. Chem. Soc. 0002-7863 122, 11057 (2000). 10.1021/ja000991g
55. R. Hajlaoui, D. Fichou, G. Horowitz, B. Nessakh, M. Constant, and F. Garnier, Adv. Mater. 0935-9648 9, 557 (1997). 10.1002/adma.19970090708
56. H. E. Katz, J. G. Laquindanum, and A. J. Lovinger, Chem. Mater. 0897-4756 10, 633 (1998). 10.1021/cm970628h
57. J. M. Crosthwaite, M. J. Muldoon, J. K. Dixon, J. L. Anderson, J. F. Brennecke, J. Chem. Thermodyn. 0021-9614 37, 559 (2005). 10.1016/j.jct.2005.03. 013 (Pubitemid 40750633)
58. P. A. Antunes, C. J. L. Constantino, and R. F. Aroca, Langmuir 0743-7463 17, 2958 (2001). 10.1021/la001514e (Pubitemid 35337950)
59. W. Su, J. Jiang, W. Lu, and Y. Luo, Nano Lett. 1530-6984 6, 2091 (2006). 10.1021/nl061376z (Pubitemid 44555260)
60. H. -L. Cheng, W. -Y. Chou, C. -W. Kuo, Y. -W. Wang, Y. -S. Mai, F. -C. Tang, and S. -W. Chu, Adv. Funct. Mater. 1616-301X 18, 285 (2008). 10.1002/adfm.200700912 (Pubitemid 351212309)