Effect of the silanization and annealing on the morphology of thin poly(3-hexylthiophene) (P3HT) layer on silicon oxide

Surface Science

Volumn 602, Issue 19, 2008, Pages 3106-3115

  Scavia, Guido ^a   Porzio, William ^b   Destri, Silvia ^b   Barba, Luisa ^c   Arrighetti, Gianmichele ^c   Milita, Silvia ^b   Fumagalli, Luca ^d   Natali, Dario ^d   Sampietro, Marco ^d  

^a CNR   (Italy)

^b CNR   (Italy)

^c CNR   (Italy)

^d POLITECNICO DI MILANO   (Italy)

Author keywords

AFM; OFET; X ray diffraction

Indexed keywords

ANNEALING; OXIDES; SILICA;

AFM; OFET; POLY-3-HEXYLTHIOPHENE; SILANIZATION; SILICON OXIDES; X-RAY DIFFRACTION;

SILICON COMPOUNDS;

EID: 53149141351     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2008.08.009     Document Type: Article

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