Film morphology and thin film transistor performance of solution-processed oligothiophenes

Chemistry of Materials

Volumn 16, Issue 23, 2004, Pages 4783-4789

  Chang, Paul C ^a   Lee, Josephine ^a   Huang, Daniel ^a   Subramanian, Vivek ^a   Murphy, Amanda R ^b   Fréchet, Jean M J ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; DERIVATIVES; ORGANIC POLYMERS; ORGANIC SOLVENTS; THIN FILMS;

CRYSTALLINE FILMS; FILM MORPHOLOGY; SEXITHIOPHENE DERIVATIVES;

THIN FILM TRANSISTORS;

CRYSTALLIN; OLIGOTHIOPHENE; SOLUBILIZER; SOLVENT; THIOPHENE DERIVATIVE; UNCLASSIFIED DRUG;

ARTICLE; ATOMIC FORCE MICROSCOPY; FILM; ROOM TEMPERATURE; SEMICONDUCTOR; SOLUBILITY; SYNTHESIS;

EID: 8444242167     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm0496570     Document Type: Article

References (39)

1. Horowitz, G. Adv. Mater. 1998, 10, 365-377.
2. Katz, H. E.; Bao, Z. N.; Gilat, S. L. Acc. Chem. Res 2001, 34, 359-369.
3. Sirringhaus, H.; Tessler, N.; Friend, R. H. Science 1998, 280, 1741-1744.
4. Burroughes, J. H.; Bradley, D. D. C.; Brown, A. R.; Marks, R. N.; Mackay, K.; Friend, R. H.; Burns, P. L.; Holmes, A. B. Nature 1990, 347, 539-541.
5. Kovac, J.; Peternai, L.; Lengyel, O. Thin Solid Films 2003, 433, 22-26. Furuta, P.; Brooks, J.; Thompson, M. E.; Fréchet, J. M. J. J. Am. Chem. Soc. 2003, 125, 13165-72.
6. Kovac, J.; Peternai, L.; Lengyel, O. Thin Solid Films 2003, 433, 22-26. Furuta, P.; Brooks, J.; Thompson, M. E.; Fréchet, J. M. J. J. Am. Chem. Soc. 2003, 125, 13165-72.
7. Huynh, W. U.; Dittmer, J. J.; Janke J.; Libby, William C.; Whiting, Gregory L.; Alivisatos, A. P. Adv. Funct. Mater. 2003, 13, 73-79. Liu, J.; Tanaka, T.; Sivula, K.; Alivisatos, A. P.; Fréchet, J. M. J. J. Am. Chem. Soc. 2004, 126, 6550-6551.
8. Huynh, W. U.; Dittmer, J. J.; Janke J.; Libby, William C.; Whiting, Gregory L.; Alivisatos, A. P. Adv. Funct. Mater. 2003, 13, 73-79. Liu, J.; Tanaka, T.; Sivula, K.; Alivisatos, A. P.; Fréchet, J. M. J. J. Am. Chem. Soc. 2004, 126, 6550-6551.
9. Crone, B.; Dodabalapur, A.; Gelperin, A.; Torsi, L.; Katz, H. E.; Lovinger, A. J.; Bao, Z. Appl. Phys. Lett. 2001, 78, 2229-2231.
10. Someya, T.; Katz, H. E.; Gelperin, A.; Lovinger, A. J.; Dodabalapur, A. Appl. Phys. Lett. 2002, 81, 3079-3081.
11. Brown, A. R.; Pomp, A.; Hart, C. M.; Deleeuw, D. M. Science 1995, 270, 972-974.
12. Crone, B.; Dodabalapur, A.; Lin, Y. Y.; Filas, R. W.; Bao, Z.; LaDuca, A.; Sarpeshkar, R.; Katz, H. E.; Li, W. Nature 2000, 403, 521-523
13. Drury, C. J.; Mutsaers, C. M. J.; Hart, C. M.; Matters, M.; de Leeuw, D. M. Appl. Phys. Lett. 1998, 73, 108-110.
14. Garnier, F.; Hajlaoui, R.; Yassar, A.; Srivastava, P. Science 1994, 265, 1684-1686.
15. Rogers, J. A.; Bao, Z.; Meier, M.; Dodabalapur, A.; Schueller, O. J. A.; Whitesides, G. M. Synth. Met. 2000, 115, 5-11.
16. Rogers, J. A.; Bao, Z.; Baldwin, K.; Dodabalapur, A.; Crone, B.; Raju, V. R.; Kuck, V.; Katz, H.; Amundson, K.; Ewing, J.; Drzaic, P. Proc. Natl. Acad. Sci. U.S.A. 2001, 98, 4835-4840.
17. Sirringhaus, H.; Kawase, T.; Friend, R. H.; Shimoda, T.; Inbasekaran, M.; Wu, W.; Woo, E. P. Science 2000, 290, 2123-2126.
18. Speakman, S. P.; Rozenburg, G. G.; Clay, K. J.; Milne, W. I.; Ille, A.; Gardner, I. A.; Bresler, E.; Steinke, J. H. G. Org. Electron. 2001, 2, 65-73.
19. Afzali, A.; Breen, T. L.; Kagan, C. R. Chem. Mater. 2002, 14, 1742-1746.
20. Garnier, F.; Hajlaoui, R.; El Kassmi, A.; Horowitz, G.; Laigre, L.; Porzio, W.; Armanini, M.; Provasoli, F. Chem. Mater. 1998, 10, 3334-3339.
21. Katz, H. E.; Li, W.; Lovinger, A. J.; Laquindanum, J. Synth. Met. 1999, 102, 897-899.
22. Sandberg, H.; Henze, O.; Kilbinger, A. F. M.; Sirringhaus, H.; Feast, W. J.; Friend, R. H. Synth. Met. 2003, 137, 885-886.
23. Schenning, A. P. H. J.; Kilbinger, A. F. M.; Biscarini, F.; Cavallini, M.; Cooper, H. J.; Derrick, P. J.; Feast, W. J.; Lazzaroni, R.; Leclère, P.; McDonell, L. A.; Meijer, E. W.; Meskers, S. C. J. J. Am. Chem. Soc. 2002, 124, 1269-1275.
24. Murphy, A. R.; Fréchet, J. M. J.; Chang, P.; Lee, J.; Subramanian, V. J. Am. Chem. Soc. 2004, 126, 1596-1597.
25. The decomposition temperature is affected markedly by the conditions used to carry out thermolysis, since the process is acid-catalyzed and acid is produced during the thermolysis. In the presence of trace amounts of acid (that may also originate from the solvent used in sample preparation or the surface itself), the decomposition temperature is lowered significantly.
26. Fujimoto, H.; Nagashima, U.; Inokuchi, H.; Seki, K.; Nakahara, H.; Nakayama, J.; Hoshino, M.; Fukuda, K. J. Chem. Phys. 1988, 89, 1198-1199. It should be noted here that spontaneous thermal polymerization of 4 can also occur at elevated temperatures.
27. Becker, R. S.; Demelo, J. S.; Macanita, A. L.; Elisei, F. Pure Appl. Chem. 1995, 67, 9-16.
28. Lang, P.; Hajlaoui, R.; Garnier, F.; Desbat, B.; Buffeteau, T.; Horowitz, G.; Yassar, A. J. Phys. Chem. 1995, 99, 5492-5499.
29. Garnier, F.; Yassar, A.; Hajlaoui, R.; Horowitz, G.; Deloffre, F.; Servet, B.; Ries, S.; Alnot, P. J. Am. Chem. Soc. 1993, 115, 8716-8721.
30. Müller, E.; Ziegler, C. J. Mater. Chem. 2000, 10, 47-53.
31. Bauer, E. Z. Kristallogr. 1958, 372.
32. Sirringhaus, H.; Tessler, N.; Friend, R. H. Synth. Met. 1999, 102, 857-860.
33. Halik, M.; Klauk, H.; Zschieschang, U.; Schmid, G.; Ponomarenko, S.; Kirchmeyer, S.; Weber, W. Adv. Mater. 2003, 15, 917-923.
34. Bao, Z. N.; Kuck, V.; Rogers, J. A.; Paczkowski, M. A. Adv. Funct. Mater. 2002, 12, 526-531.
35. Klauk, H.; Halik, M.; Zschieschang, U.; Schmid, G.; Radlik, W.; Weber, W. J. Appl. Phys. 2002, 92, 5259-5263.
36. Collet, J.; Tharaud, O.; Chapoton, A.; Vuillaume, D. Appl. Phys. Lett. 2000, 76, 1941-1943.
37. Bao, Z. N.; Dodabalapur, A.; Lovinger, A. J. Appl. Phys. Lett. 1996, 69, 4108-4110.
38. Dimitrakopoulos, C. D.; Malenfant, P. R. L. Adv. Mater. 2002, 14, 99.
39. Huang, D.; Liao, F.; Molesa, S.; Redinger, D.; Subramanian, V. J. Electrochem. Soc. 2003, 150, G412-G417.