Nitrogen doping in pulsed laser deposited ZnO thin films using dense plasma focus

Applied Surface Science

Volumn 257, Issue 6, 2011, Pages 1979-1985

  Karamat, S ^a   Rawat, R S ^a   Tan, T L ^a   Lee, P ^a   Springham, S V ^a   Ghareshabani, E ^a,b   Chen, R ^c   Sun, H D ^c  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b SAHAND UNIVERSITY OF TECHNOLOGY   (Iran)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Amorphization; Dense plasma focus; Nitrogen doping

Indexed keywords

AMORPHIZATION; BINDING ENERGY; ELECTRONS; II-VI SEMICONDUCTORS; IONS; METALLIC FILMS; NITROGEN; NITROGEN PLASMA; OPTICAL FILMS; OPTICAL PROPERTIES; OXYGEN; PLASMA DEVICES; PLASMA THEORY; PULSED LASER DEPOSITION; PULSED LASERS; SEMICONDUCTOR DOPING; TEMPERATURE; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

COMPOSITIONAL ANALYSIS; DENSE PLASMA FOCUS; IRRADIATED SAMPLES; NITROGEN-DOPING; OXYGEN AND NITROGENS; OXYGEN GAS PRESSURE; PLASMA FOCUS DEVICES; SUBSTRATE TEMPERATURE;

THIN FILMS;

EID: 78650279488     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.09.038     Document Type: Article

References (45)

1. D.S. Liu, C.S. Sheu, and C.T. Lee J. Appl. Phys. 102 2007 033516
2. J.G. Lu, L.P. Zhu, Z.Z. Ye, F. Zhuge, Y.J. Zeng, B.H. Zhao, and D.W. Ma Appl. Surf. Sci. 245 2005 109
3. Z. Yang, J.H. Lim, S. Chu, Z. Zuo, and J.L. Liu Appl. Surf. Sci. 255 2008 3375
4. B.S. Li, Y.C. Liu, Z.Z. Zhi, D.Z. Shen, J.Y. Zhang, Y.M. Lu, X.W. Fan, and X.G. Kong J. Vac. Sci. Technol. A 20 5 2002 1779
5. R. Groenen, J. Loffler, J.L. Linden, R.E.I. Schropp, and M.C.M. van de Sanden Thin Solid Films 492 2005 298
6. T. David, S. Goldsmith, and R.L. Boxman Vac. Technol. Coat. 6 4 2005 40
7. Z. Xin, W.S. Qi, L.G. Jun, and X.G. Cheng Chin. Phys. 15 2006 199
8. S. Amirhaghi, V. Craciun, D. Craciun, J. Elder, and I.W. Boyd Microelectron. Eng. 25 1994 32l 326
9. S.B. Zhang, S.H. Wei, and A. Zunger Phys. Rev. B 63 2001 075205
10. A. Kobayashi, O.F. Sankey, and J.D. Dow Phys. Rev. B 28 1983 946
11. M.L. Tu, Y.K. Su, and C.Y. Ma J. Appl. Phys. 100 2006 053705
12. F. Zhuge, L.P. Zhu, Z.Z. Ye, J.G. Lu, B.H. Zhao, J.Y. Huang, L. Wang, Z.H. Zhang, and Z.G. Ji Thin Solid Films 476 2005 272
13. J.W. Mather, and P.J. Bottoms Phys Fluids 11 1968 611
14. S. Lee, T.Y. Tou, S.P. Moo, M.A. Eissa, A.V. Gholap, K.H. Kwek, S. Mulyodrono, A.J. Smith, W. Suryadi, M. Usada, and Zakaullah Am. J. Phys. 56 1988 62
15. S. Lee, P. Lee, G. Zhang, A. Serban, M. Liu, X. Feng, S.V. Springham, C. Selvam, V. Kudryashov, and T.K.S. Wong Sing. J. Phys. 14 1998 1
16. R.S. Rawat, M.P. Srivastava, S. Tandon, and A. Mansingh Phys. Rev. B 47 1993 4858
17. R. Sagar, and M.P. Srivastava Phys. Lett. A 183 1993 209
18. P. Agarwal, S. Annapoorni, M.P. Srivastava, R.S. Rawat, and P. Chauhan Phys. Lett. A 231 1997 434
19. M.P. Srivastava, S.R. Mohanty, S. Annapoorni, and R.S. Rawat Phys. Lett. A 215 1996 63
20. R.S. Rawat, P. Arun, A.G. Videshwar, Y.L. Lam, P. Lee, M.H. Liu, S. Lee, and A.C.H. Huan Mater. Res. Bull. 35 2000 477
21. R.S. Rawat, P. Arun, A.G. Videshwar, P. Lee, and S. Lee J. Appl. Phys. 95 2004 7725
22. T.K. Borthakur, A. Sahu, S.R. Mohanty, B.B. Nayak, and B.S. Aharya Surf. Eng. 15 1999 55
23. R. Gupta, and M.P. Srivastava Plasma Source Sci. Technol. 13 2004 371
24. Z.Y. Pan, J.J. Lin, T. Zhang, S. Karamat, T.L. Tan, P. Lee, S.V. Springham, R.V. Ramanujan, and R.S. Rawat Thin Solid Films 517 2009 2753
25. I. Sakaguchi, Y. Sato, H. Haneda, and N. Ohashi Jpn. J. Appl. Phys. 45 9A 2006 7053
26. J. Kennedy, B. Sundrakannan, R.S. Katiyar, A. Markwitz, Z. Li, and W. Gao Curr. Appl. Phys. 8 2008 291
27. J.J. Lin, M.V. Roshan, Z.Y. Pan, R. Verma, P. Lee, S.V. Springham, T.L. Tan, and R.S. Rawat J. Phys. D: Appl. Phys. 41 2008 135213
28. I.A. Khan, M. Hassan, R. Ahmad, A. Qayyum, G. Murtaza, M. Zakaullah, and R.S. Rawat Thin Solid Films 516 2008 8255
29. M. Sadiq, M. Shafiq, A. Waheed, R. Ahmad, and M. Zakaullah Phys. Lett. A 352 2006 150
30. A. Nakagawa, F. Masuoka, S. Chiba, H. Endo, K. Megro, Y. Kashiwaba, T. Ojima, K. Aota, I. Niikuraa, and Y. Kashiwab Appl. Surf. Sci. 254 2007 164 166
31. A.B.M. Almamun Ashrafi, I. Suemune, H. Kumano, and S. Tanaka Jpn. J. Appl. Phys. 41 2002 1281
32. S. Park, T. Minegishi, D. Oh, H. Lee, T. Taishi, J. Park, M. Jung, J. Chang, I. Im, J. Ha, S. Hong, I. Yonenaga, T. Chikyow, and T. Yao Appl. Phys. Expr. 3 2010 031103
33. J. Xu, R. Ott, A.S. Sabau, Z.W. Pan, F.X. Xiu, J.L. Liu, J.M. Erie, and D.P. Norton Appl. Phys. Lett. 92 2008 151112
34. R. Chen, G.Z. Xing, J. Gao, Z. Zhang, T. Wu, and H.D. Sun Appl. Phys. Lett. 95 2009 061908
35. J.W. Sun, Y.M. Lu, Y.C. Liu, D.Z. Shen, Z.Z. Zhang, B. Yao, B.H. Li, J.Y. Zhang, D.X. Zhao, and X.W. Fan J. Appl. Phys. 102 2007 043522
36. L.J. Wang, and N.C. Giles Appl. Phys. Lett. 84 2004 3049
37. J. Lu, Q. Liang, Y. Zhang, Z. Ye, and S. Fujita J. Phys. D 40 2007 3177
38. C.J. Cong, L. Liao, Q.Y. Liu, J.C. Li, and K.L. Zhang Nanotechnology 17 2006 1520
39. J.G. Ma, Y.C. Liu, R. Mu, J.Y. Zhang, Y.M. Lu, D.Z. Shen, and X.W. Fan J. Vac. Sci. Technol. B 22 2004 94
40. G.W. Cong Appl. Phys. Lett. 88 2006 062110
41. M. Joseph, H. Tabata, and T. Kawai Jpn. J. Appl. Phys. 38 1999 L1205
42. C.L. Perkins, S.H. Lee, X. Li, S.E. Asher, and T.J. Coutts J. Appl. Phys. 97 2005 034907
43. H. Wang, H.P. Ho, K.C. Lo, and K.W. Cheah J. Phys. D: Appl. Phys. 40 2007 4682
44. J.C.C. Fan, and J.B. Goodenough J. Appl. Phys. 48 1977 3524
45. M. Chen, X. Wang, Y.H. Yu, Z.L. Pei, X.D. Bai, C. Sun, R.F. Huang, and L.S. Wen Appl. Surf. Sci. 158 2000 134