Nitridation of zirconium using energetic ions from plasma focus device

Thin Solid Films

Volumn 516, Issue 23, 2008, Pages 8255-8263

  Khan, I A ^a   Hassan, M ^a   Ahmad, R ^a   Qayyum, A ^a   Murtaza, G ^a   Zakaullah, M ^b   Rawat, R S ^c  

^a GC UNIVERSITY   (Pakistan)

^b QUAID I AZAM UNIVERSITY   (Pakistan)

^c NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Plasma focus; Residual stresses; Sputtering; Surface hardening; Zirconium nitride

Indexed keywords

ELECTROLYSIS; NITROGEN; NONMETALS; PLASMA DEPOSITION; PLASMA DEVICES; PLASMAS; ZIRCONIUM;

ANGULAR POSITIONING; ENERGETIC IONS; NITROGEN IONS; PLASMA FOCUS; RESIDUAL STRESSES; SPUTTERING; SURFACE HARDENING; X-RAY DIFFRACTION; ZIRCONIUM NITRIDE;

X RAY DIFFRACTION ANALYSIS;

EID: 50849123742     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.03.012     Document Type: Article

References (43)

1. Ahmad S., Hussain S.S., Sadiq M., Shafiq M., Waheed A., and Zakaullah M. Plasma Phys. Control Fusion 48 (2006) 745
2. Ahmad S., Sadiq M., Shafiq M., Waheed A., Lee P., and Zakaullah M. Plasma Sources Sci. Technol. 15 (2006) 314
3. Takao K., Honda T., Kitamura I., and Masugata K. Plasma Sources Sci. Technol. 12 (2003) 407
4. Ahmad R., Hassan M., Murtaza G., Waheed A., and Zakaullah M. J. Fusion Energy 21 (2003) 217
5. Rawat R.S., Chew W.M., Lee P., White T., and Lee S. Surf. Coat. Technol. 173 (2003) 276
6. Kant C.R., Srivastava M.P., and Rawat R.S. Phys. Lett. A 226 (1997) 212
7. Rawat R.S., Srivastava M.P., Tandon S., and Mansingh A. Phys. Rev. B 47 (1993) 4858
8. Sagar R., and Srivastava M.P. Phys. Lett. A 183 (1993) 209
9. Gupta R., and Srivastava M.P. Plasma Sources Sci. Technol. 13 (2004) 371
10. Hassan M., Ahmad R., Qayyum A., Murtaza G., Waheed A., and Zakaullah M. Vacuum 81 (2006) 291
11. Nayak B.B., Acharya B.S., Mohanty S.R., Borthakur T.K., and Bhuyan H. Surf. Coat. Technol. 145 (2001) 8
12. Aouadi S.M., Filip P., and Debessai M. Surf. Coat. Technol. 187 (2004) 177
13. Ramos H.J., and Valmoria N.B. Vacuum 73 (2004) 549
14. Lopez G., and Staia M.H. Surf. Coat. Technol. 200 (2005) 2092
15. Wu D., Zhang Z., Fu W., Fan X., and Guo H. Appl. Phys. A 64 (1997) 593
16. Ribbinga C.G., and Roos A. Handbook of Optical Constant of Solids vol. II (1998), Academic Press, Orlando, FL 351
17. Horita S., Tujikawa T., Akahori H., Kobayashi M., and Hata T. J. Sci. Technol. 11/5 (1993) 2452
18. Li J., Dzivenko D., Zerr A., Fasel C., Zhou Y., and Riedel R. Z. Anorg. Allg. Chem. 631 (2005) 1449
19. Igarashi Y., Yamaji T., and Nishikawa S. Jpn. J. Appl. Phys. 29 (1990) L2337
20. Yotsuya T., Yoshitake M., and Yamamoto J. Appl. Phys. Lett. 51 (1987) 235
21. Karlsson B., Shimshoch R.P., Seraphin B.O., and Haygarth J.O. Sol. Energy Mater. 7 (1983) 401
22. Lee M.B., Kawasaki M., Yoshimoto M., Kumagai M., and Koinuma H. Jpn. J. Appl. Phys. 33 (1994) 6308
23. Rossnaget S.M., Cuomo J.J., and Westwood W.D. Handbook of Plasma Processing Technology (1990), Noyes Publications, NJ
24. Bringans R.D., and Liang W.Y. J. Phys. C 14 (1981) 1065
25. Kondo S., Matasuoka S., and Saito T. Phys. Status Solidi A 165 (1998) 271
26. Rhee M.J. Appl. Phys. Lett. 37 (1980) 906
27. Hassan M., Qayyum A., Ahmad R., Murtaza G., and Zakaullah M. J. Phys. D Appl. Phys. 40 (2007) 769
28. Kelly H., Lepone A., Marquez A., Sadowski M., Baranowski J., and Scladnik-Sadowska E. IEEE Trans. Plasma Sci. 26 (1998) 113
29. Nunomura S., Koga K., Shitarani M., Watanabe Y., Morisada Y., Matsuki N., and Ikeda S. Jpn. J. Appl. Phys. Part 2 44 (2005) L1509
30. Bertalot I., and Herold H. Phys. Lett. Part A 79 (1980) 389
31. Sanchez G., and Feugeas J. J. Phys. D Appl. Phys. 30 (1997) 927
32. Breese M.B.H. Mater. Res. Soc. Bull. 25 (2000) 11
33. Lin J.J., Mahmood S., Zhang T., Hassan S.M., White T., Ramanujan R.V., Lee P., and Rawat R.S. J. Phys. D Appl. Phys. 40 (2007) 2548
34. Lin J.J., Mahmood S., Tan T.L., Springham S.V., Lee P., and Rawat R.S. Nanotechnology 18 (2007) 115617
35. Becker K., and Ebert F. Z. Phys. 31 (1925) 268
36. Khidirov I., Em V., Karimov I., and Loryon V. Phys. Met. Metallogr. 64 (1990) 174
37. Lerch M., Fueglein E., and Wrba J. Z. Anorg. Allg. Chem. 622 (1996) 367
38. Cullity B.D., and Stock S.R. Elements of X-ray Diffraction. third ed. (2001), Prentice Hall, New-Jersey 388
39. Gurarie V.N., Otsuka P.H., Jamieson D.N., and Prawer S. Nucl. Instrum. Methods Phys. Res. B 242 (2006) 421
40. Rawat R.S., Arun P., Vedeshwar A.G., Lee P., and Lee S. J. Appl. Phys. 95/12 (2004) 7725
41. Nose M., Zhou M., Nagae T., Mae T., Yokota M., and Saji S. Surf. Coat.Technol. 132 (2000) 163
42. Budzynski P., Youssef A.A., Surowiec Z., and Paluch R. Vacuum 81 (2007) 1154
43. Liu C.P., and Yang H.G. Thin Solid Films 444 (2003) 111