Carbon ion implantation on titanium for TiC formation using a dense plasma focus device

Plasma Sources Science and Technology

Volumn 13, Issue 3, 2004, Pages 371-374

  Gupta, Ruby ^a   Srivastava, M P ^a  

^a UNIVERSITY OF DELHI   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODIC ARC PLASMA DEPOSITION; DENSE PLASMA FOCUS (DPF); ENERGY STORAGE CAPACITORS; ION BEAM SPUTTERING;

CAPACITORS; CARBON; CATHODES; CHEMICAL VAPOR DEPOSITION; ELECTRIC CURRENTS; ELECTRIC POWER SYSTEMS; ELECTRODES; ION BEAM ASSISTED DEPOSITION; MAGNETIC FIELDS; PLASMA SOURCES; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TITANIUM CARBIDE; X RAY DIFFRACTION;

ION IMPLANTATION;

EID: 4444372983     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/13/3/002     Document Type: Article

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