Acid and base diffussion in chemically amplified DUV resists

Microelectronic Engineering

Volumn 35, Issue 1-4, 1997, Pages 149-152

  Itani, T ^a   Yoshino, H ^a   Hashimoto, S ^a   Yamana, M ^a   Samoto, N ^a   Kasama, K ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDS; DIFFUSION; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICES;

ACID DIFFUSION; BASE DIFFUSION; CHEMICALLY AMPLIFIED RESIST; DEEP ULTRAVIOLET; N METHYL PYRROLIDONE; PHOTOACID GENERATOR; TERT-BUTOXYCARBONYL;

PHOTORESISTS;

EID: 0031071160     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(96)00176-1     Document Type: Article

References (14)

1. T. Itani, H. Yoshino, M. Fujimoto and K. Kasama, J. Vac. Sci. Technol. B13, 3026 (1995).
2. T. Itani, H. Yoshino, S. Hashimoto, M. Yamana, N. Samoto and K. Kasama, to be published in J. Vac. Sci. Technol. (1996) (EIPBN'96).
3. T. Itani, H. Yoshino, S. Hashimoto, M. Yamana, N. Samoto and K. Kasama, to be published in Jpn. J. Appl. Phys. (1996) (MPC'96).
4. T. Itani, H. Iwasaki, M. Fujimoto and K. Kasama, Jpn. J. Appl. Phys. 33, 7005 (1994).
5. J. Nakamura, H. Ban, K. Deguchi and A. Tanaka, Jpn. J. Appl. Phys. 30, 2619 (1991).
6. D.R. MacKean, U. Schaedeli and S.A. MacDonald, ACS Symp. Ser. 412, 27 (1989).
7. T. Yoshimura, H. Shiraishi and S. Okazaki, Jpn. J. Appl. Phys. 34, 6786 (1995).
8. K. Asakawa, T. Ushirogouchi and M. Nakase, J. Photopolymer Sci. Technol., 7 (3) 497 (1994).
9. F.M. Houlihan, E. Chin, O. Nalamasu, J.M. Kometani and R. Harley, ACS Symp. Ser. 614, 84 (1995).
10. T.H. Fedynyshyn, J.W. Thackeray, J.H. Georger and M.D. Denison, J. Vac. Sci. Technol. B 12, 3888 (1994).
11. I. Raptis, L. Grella, P. Argitis, M. Gentili, N. Glezos and G. Petrocco, Microel. Eng. 30, 295 (1995).
12. Y. Kawai, A. Otaka, A. Tanaka and T. Matsuda, Jpn. J. Appl. Phys. 33, 7023 (1994).
13. S. Hashimoto, T. Itani, H. Yoshino, M. Yamana, N. Samoto and K. Kasama, J. Photopolymer Sci. Technol., 9 (4) 591 (1996).
14. T. Itani, H. Iwasaki, H. Yoshino, M. Fujimoto and K. Kasama, Proc. SPIE 2438, 191 (1995).