Resist double patterning on BARCs and spin-on multilayer materials

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7520, Issue , 2009, Pages

  Guerrero, Douglas J ^a   Sullivan, Daniel M ^a   Mercado, Ramil Marcelo L ^a  

^a BREWER SCIENCE INC   (United States)

Author keywords

Anti reflective; Double patterning; LFLE; LPLE; Multilayer; Negative tone development; Spin on

Indexed keywords

A-CARBON; A-THERMAL; ANTI-REFLECTIVE; DIFFERENTIAL ENERGY; DOUBLE PATTERNING; ETCH PROCESS; HARDMASKS; MULTILAYER MATERIALS; MULTILAYER STACKS; NEGATIVE TONES; ORGANIC BOTTOM ANTI-REFLECTIVE COATINGS; PATTERN PROFILE; PATTERNED IMAGE; PATTERNED PHOTORESISTS; PATTERNING PROCESS; PROCESS STEPS; SPIN-ON; UNDERLAYERS;

ACTIVATION ENERGY; ANTIREFLECTION COATINGS; LITHOGRAPHY; MULTILAYERS; SPIN DYNAMICS;

REFLECTIVE COATINGS;

EID: 77952075654     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.840419     Document Type: Conference Paper

References (7)

1. S. Shimura, M. Kushibiki, T. Kawasaki, R. Tanaka, A. Tokui, Y. Ishii, "Fine trench patterns with double patterning and trench shrink technology," Proceedings of SPIE, vol.7273, 72730A (2009).
2. G. Wakamatsu, Y. Anno, M. Hori, T. Kakizawa, M. Mita, K. Hoshiko, T. Shioya, K. Fujiwara, S. Kusumoto, Y. Yamaguchi, T. Shimokawa, "Double patterning process with freezing technique," Proceedings of SPIE, vol.7273, 72730B (2009).
3. T. Kakizawa, G. Wakamatsu, Y. Anno, M. Hori, M. Mita, K. Hoshiko, T. Shioya, K. Fujiwara, S. Kusumoto, Y. Yamaguchi, T. Shimokawa, "Freezing material development for double patterning process," Journal of Photopolymer Science and Technology, vol.22, no.5, pp. 641-646 (2009).
4. T. Nakamura, M. Takeshita, S. Maemori, R. Uchida, R. Takasu, K. Ohmori, "Newly developed positive tone resists for posi/posi double patterning process," Proceedings of SPIE, vol.7273, 727304 (2009).
5. T. Nakamura, R. Takasu, P. Wong, M. Maendhout, "Process Feasibility Investigation of Freezing Free Process," Journal of Photopolymer Science and Technology, v. 22, no.5, pp. 647-652 (2009).
6. S. Tarutani, T. Hideaki, S. Kamimura, "Development of materials and processes for negative tone development toward 32-nm node 193-nm immersion double-patterning process," Proceedings of SPIE, vol.7273, 72730-C (2009).
7. S. Tarutani, H. Tsubaki, S. Kamimura, "Materials and processes of negative tone development for double patterning process," Journal of Photopolymer Science and Technology, v. 22, no.5, pp. 635-640 (2009).