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Journal of Non-Crystalline Solids

Volumn 299-302, Issue PART 2, 2002, Pages 978-982

Amorphous As-S-Se semiconductor resists for holography and lithography

(1) Teteris, J a

a UNIVERSITY OF LATVIA (Latvia)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; ELECTRON BEAMS; HEAT TREATMENT; HOLOGRAPHY; LITHOGRAPHY; SOLUBILITY; THIN FILMS;

AMORPHOUS SEMICONDUCTORS;

SEMICONDUCTOR MATERIALS;

EID: 0036530792 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-3093(01)01126-7 Document Type: Article

Times cited : (35)

References (11)

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2
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3
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- H.P. Herzig (Ed.), Taylor and Francis, London
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6
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- Teteris, J.¹

7
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- Teteris, J.¹ Nordman, O.²

8
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- (1997) Chem. Papers , vol.51 , pp. 310
- Frumar, M.¹ Polak, Z.² Černošek, Z.³ Frumarova, B.⁴ Wagner, T.⁵

9
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- Jefimov, K.¹ Honkanen, M.² Laakkonen, P.³ Turunen, J.⁴ Jaaskelainen, T.⁵ Teteris, J.⁶

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.