Materials for and performance of multilayer lithography schemes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6519, Issue PART 2, 2007, Pages

  Weimer, Marc ^a   Wang, Yubao ^a   Neef, Charles J ^a   Claypool, James ^a   Edwards, Kevin ^a   Zhu, Zhimin ^a  

^a BREWER SCIENCE INC   (United States)

Author keywords

45 nm node; Anti reflective coatings; BARC; Immersion lithography; Multilayer lithography; Planarization; Spin on hardmask; Trilayer

Indexed keywords

ANTIREFLECTION COATINGS; ETCHING; MASKS; MULTILAYER FILMS; OPTICS;

45-NM NODE; IMMERSION LITHOGRAPHY; MULTILAYER LITHOGRAPHY; PLANARIZATION; SPIN ON HARDMASK; TRILAYERS;

PHOTORESISTS;

EID: 35148876130     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712342     Document Type: Conference Paper

References (4)

1. Meador, James D.; Holmes, Doug; DiMenna, William; Nagatkina, Mariya I.; Rich, Michael D.; Flaim, Tony D.; Bennett, Randy; Koayasi, Ichiro, "193-nm multilayer imaging systems," Proc SPIE 5039, 948-959 (2003).
2. Meador, James D.; Holmes, Doug; Nagatkina, Mariya I.; Puligadda, Rama; Gum, Denise; Bennett, Randy; Sun, Sam X.; Enomoto, Tomoyuki, "New materials for 193-nm trilayer imaging," Proc. SPIE 5376, 1138-1148 (2004).
3. Claypool, James B.; Weimer, Marc; Krishnamurthy, Vandana; Gehoel, Wendy; van Ingen Schenau, Koen, "New advanced BARC material for ultra-high NA applications," Proc SPIE 5753, 679-689 (2005)
4. th edition, Pergamon Press, 1975