A chemically amplified calix[4]arene-based electron-beam resist

Microelectronic Engineering

Volumn 73-74, Issue , 2004, Pages 228-232

  Sailer, H ^a   Ruderisch, A ^a   Kern, D P ^a   Schurig, V ^a  

^a UNIVERSITY OF TÜBINGEN   (Germany)

Author keywords

Calix 4 arene; Chemical amplification; Electron beam resist

Indexed keywords

CROSSLINKING; ETCHING; MOLECULAR STRUCTURE; PHENOLS; POLYMERIZATION; POSITIVE IONS; RESINS; SALTS; SENSITIVITY ANALYSIS;

CALIX[4]ARENE; CHEMICAL AMPLIFICATION; ELECTRON BEAM RESISTS; SENSITIVITY ENHANCEMENT;

ELECTRON BEAM LITHOGRAPHY;

EID: 17344384076     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(04)00103-0     Document Type: Conference Paper

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