Direct writing of sub-5 nm hafnium diboride metallic nanostructures

ACS Nano

Volumn 4, Issue 11, 2010, Pages 6818-6824

  Ye, Wei ^a,b   Peña Martin, Pamela A ^b   Kumar, Navneet ^b   Daly, Scott R ^a   Rockett, Angus A ^b   Abelson, John R ^b   Girolami, Gregory S ^a   Lyding, Joseph W ^a,b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b University of Illinois at Urbana Champaign   (United States)

Author keywords

Electron beam induced deposition; Hafnium diboride; Nanodot; Nanowire; Scanning tunneling microscopy; Scanning tunneling spectroscopy; Sub 5 nm

Indexed keywords

ELECTRON BEAM-INDUCED DEPOSITION; HAFNIUM DIBORIDE; NANODOTS; SCANNING TUNNELING SPECTROSCOPY; SUB-5 NM;

BORIDES; ELECTRON BEAMS; ELECTRON OPTICS; HAFNIUM; METALLIC COMPOUNDS; NANOSTRUCTURED MATERIALS; NANOWIRES; SCANNING TUNNELING MICROSCOPY; SPECTROSCOPY;

SCANNING;

EID: 78649603305     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn1018522     Document Type: Article

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