Hafnium diboride thin films by chemical vapor deposition from a single source precursor

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 6, 2005, Pages 1619-1625

  Jayaraman, Sreenivas ^a   Yang, Yu ^a   Kim, Do Young ^a,b   Girolami, Gregory S ^a,b   Abelson, John R ^a  

^a University of Illinois at Urbana Champaign   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER DIFFUSION; DEPOSITION TEMPERATURES;

ACTIVATION ENERGY; ANNEALING; ASPECT RATIO; CHEMICAL VAPOR DEPOSITION; COPPER; ELECTRIC CONDUCTIVITY; MICROSTRUCTURE; STOICHIOMETRY; TEMPERATURE DISTRIBUTION; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

HAFNIUM COMPOUNDS;

EID: 31044452458     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2049307     Document Type: Article

References (43)

1. R. Kieffer and F. Benesovsky, Hartstoffe (Springer, Wien, 1963).
2. CRC Materials Science and Engineering Handbook, 2nd ed. (CRC Press, Boca Raton, 1994).
3. J. W. Sung, D. M. Goedde, G. S. Girolami, and J. R. Abelson, J. Appl. Phys. 91, 3904 (2002).
4. L. M. Williams, J. Electrochem. Soc. 133, C225 (1986).
5. J. S. Chen and J. L. Wang, J. Electrochem. Soc. 147, 1940 (2000).
6. S. T. Lin, Y. L. Kuo, and C. Lee, Appl. Surf. Sci. 220, 349 (2003).
7. J. Castaing and P. Costa, Boron and Refractory Borides, edited by, V. I. Matkovich, (Springer, New York, 1977), Chap., p. 390.
8. J. Tolle, J. Kouvetakis, D. W. Kim, S. Mahajan, A. Bell, F. A. Ponce, I. S. T. Tsong, M. L. Kottke, and Z. H. D. Chen, Appl. Phys. Lett. 84, 3510 (2004).
9. J. Tolle, R. Roucka, I. S. T. Tsong, C. Ritter, P. A. Crozier, A. V. G. Chizmeshya, and J. Kouvetakis, Appl. Phys. Lett. 82, 2398 (2003).
10. C. W. Hu, A. V. G. Chizmeshya, J. Tolle, J. Kouvetakis, and I. S. T. Tsong, J. Cryst. Growth 267, 554 (2004).
11. C. Y. Tay, I. R. Harris, and S. J. Wright, J. Electron. Mater. 18, 511 (1989).
12. T. Shikama, Y. Sakai, M. Fukutomi, and M. Okada, Thin Solid Films 156, 287 (1988).
13. Binary Alloy Phase Diagrams, edited by, T. B. Massalski, H. Okamoto, P. R. Subramanian, and, L. Kacprzak, (ASM International, Ohio, 1990).
14. K. L. Dahm, L. R. Jordan, J. Haase, and P. A. Dearnley, Surf. Coat. Technol. 109, 413 (1998).
15. E. Kelesoglu, C. Mitterer, M. K. Kazmanli, and M. Urgen, Surf. Coat. Technol. 119, 133 (1999).
16. O. Knotek, E. Lugscheider, C. Barimani, and M. Moller, J. Solid State Chem. 133, 117 (1997).
17. M. L. Wu, X. W. Lin, V. P. Dravid, Y. W. Chung, M. S. Wong, and W. D. Sproul, Tribol. Lett. 5, 131 (1998).
18. C. Mitterer, J. Solid State Chem. 133, 279 (1997).
19. D. S. Wuu, M. L. Lee, T. Y. Lin, and R. H. Horng, Mater. Chem. Phys. 45, 163 (1996).
20. H. O. Pierson and A. W. Mullendore, Thin Solid Films 95, 99 (1982).
21. M. Mukaida, T. Goto, and T. Hirai, J. Mater. Sci. 26, 6613 (1991).
22. B. N. Beckloff and W. J. Lackey, J. Am. Ceram. Soc. 82, 503 (1999).
23. A. J. Caputo, W. J. Lackey, I. G. Wright, and P. Angelini, J. Electrochem. Soc. 132, 2274 (1985).
24. S. Veprek, P. Nesladek, A. Niederhofer, F. Glatz, M. Jilek, and M. Sima, Surf. Coat. Technol. 109, 138 (1998).
25. J. A. Jensen, J. E. Gozum, D. M. Pollina, and G. S. Girolami, J. Am. Chem. Soc. 110, 1643 (1988).
26. A. L. Wayda, L. F. Schneemeyer, and R. L. Opila, Appl. Phys. Lett. 53, 361 (1988).
27. S. Reich, H. Suhr, K. Hanko, and L. Szepes, Adv. Mater. (Weinheim, Ger.) 4, 650 (1992).
28. http://www.mse.uiuc.edu/faculty/abelson.html
29. H. R. Hoekstra and J. J. Katz, J. Am. Chem. Soc. 71, 2488 (1949).
30. J. Humlicek, A. Nebojsa, J. Hora, M. Strasky, J. Spousta, and T. Sikola, Thin Solid Films 332, 25 (1998).
31. S. Logothetidis, I. Alexandrou, and A. Papadopoulos, J. Appl. Phys. 77, 1043 (1995).
32. R. W. Collins, I. An, H. Fujiwara, J. C. Lee, Y. W. Lu, J. Y. Koh, and P. I. Rovira, Thin Solid Films 313, 18 (1998).
33. Y. Yang, S. Jayaraman, D. Y. Kim, G. S. Girolami, and J. R. Abelson, J. Cryst. Growth (submitted).
34. J. A. Thornton, J. Vac. Sci. Technol. 6, 355 (1974).
35. B. A. Movchan and A. V. Demchisin, Phys. Met. Metallogr. 28, 83 (1969).
36. K. C. Saraswat, S. Swirhun, and J. P. Mcvittie, J. Electrochem. Soc. 131, C86 (1984).
37. U. Jansson and J. O. Carlsson, Mater. Sci. Eng., B 17, 131 (1993).
38. T. B. Gorczyca, L. R. Douglas, B. Gorowitz, and R. H. Wilson, J. Electrochem. Soc. 136, 2765 (1989).
39. M. Belyansky and M. Trenary, J. Vac. Sci. Technol. A 15, 3065 (1997).
40. R. E. DeVor, T. Chang, and J. W. Sutherland, Statistical Quality Design and Control-Contemporary Concepts and Methods (Prentice-Hall, New Jersey, 1992).
41. H. C. Wulu, K. C. Saraswat, and J. P. Mcvittie, J. Electrochem. Soc. 138, 1831 (1991).
42. A. Nuruddin, J. R. Doyle, and J. R. Abelson, J. Appl. Phys. 76, 3123 (1994).
43. J. E. Crowell, J. Vac. Sci. Technol. A 21, S88 (2003).