Chemical vapor deposition of nanometer-size aluminum features on silicon surfaces using an STM tip

Applied Surface Science

Volumn 107, Issue , 1996, Pages 11-17

  Laracuente, Arnaldo ^a   Bronikowski, Michael J ^a   Gallagher, Alan ^a  

^a UNIVERSITY OF COLORADO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ALUMINUM; AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; ELECTRIC FIELD EFFECTS; ELECTRON BEAMS; HYDROCARBONS; SCANNING TUNNELING MICROSCOPY; SURFACE STRUCTURE;

TRIMETHYLALUMINUM (TMA);

SEMICONDUCTING SILICON;

EID: 0030566232     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00514-4     Document Type: Article

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