Amorphous niobium oxide thin films

Journal of Non-Crystalline Solids

Volumn 356, Issue 50-51, 2010, Pages 2714-2721

  Ramirez G ^a,b   Rodil, S E ^a   Muhl, S ^a   Turcio Ortega, D ^a   Olaya, J J ^c   Rivera, M ^d   Camps, E ^e   Escobar Alarcon L ^e  

^a INSTITUTO DE INVESTIGACIONES EN MATERIALES   (Mexico)

^b Universidad Nacional Autonoma de Mexico Facultad de Quimica   (Mexico)

^c UNIVERSIDAD NACIONAL DE COLOMBIA   (Colombia)

^d UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

^e INSTITUTO NACIONAL DE INVESTIGACIONES NUCLEARES   (Mexico)

Author keywords

Amorphous coatings; Corrosion; Mechanical properties; Niobium oxide; Optical properties

Indexed keywords

AMORPHOUS COATING; BAND GAPS; DC POLARIZATION; DEPOSITION CONDITIONS; DEPOSITION PARAMETERS; DEPOSITION PRESSURES; ELECTROCHEMICAL RESPONSE; ENERGY DISPERSIVE X RAY SPECTROSCOPY; FLOW RATIOS; NACL SOLUTION; NIOBIUM OXIDES; POLARIZATION RESISTANCES; REACTIVE MAGNETRON SPUTTERING; TAFEL ANALYSIS;

AMORPHOUS FILMS; COATINGS; CORROSION RESISTANCE; ELECTROCHEMICAL PROPERTIES; MECHANICAL PROPERTIES; NIOBIUM; NIOBIUM OXIDE; OXIDE FILMS; OXYGEN; POLARIZATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SODIUM CHLORIDE; THIN FILMS; X RAY DIFFRACTION; X RAY SPECTROSCOPY;

OPTICAL PROPERTIES;

EID: 78449235441     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2010.09.073     Document Type: Article

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