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Volumn 49, Issue 6, 2008, Pages 1320-1326

Oblique angle deposition of columnar niobium films for capacitor application

(4) Tanvir, M Tauseef a Fushimi, K a Aoki, Y a Habazaki, H a

Author keywords

Anodic oxide; Capacitor electrode; Dielectric materials; Magnetron sputtering; Oblique angle deposition; Textured substrate surface

Indexed keywords

CAPACITANCE; CAPACITORS; COLUMNS (STRUCTURAL); DIELECTRIC DEVICES; ELECTRIC CURRENTS; ELECTRIC EQUIPMENT; ENERGY STORAGE; FRICTION; IMAGING TECHNIQUES; MAGNETRON SPUTTERING; METAL ANALYSIS; METALS; NIOBIUM; NIOBIUM COMPOUNDS; SPUTTER DEPOSITION; SURFACE PROPERTIES; SURFACE ROUGHNESS; TRANSITION METALS;

COLUMNAR MORPHOLOGY; DEPOSITED FILMS; ELECTROCHEMICAL (EC) MEASUREMENTS; JAPAN INSTITUTE OF METALS (CO); NIOBIUM (NB) FILMS; NIOBIUM OXIDES; OBLIQUE ANGLES; OBLIQUE-ANGLE DEPOSITION; SUBSTRATE SURFACES;

SUBSTRATES;

EID: 48249138698 PISSN: 13459678 EISSN: None Source Type: Journal
DOI: 10.2320/matertrans.MRA2007313 Document Type: Article

Times cited : (11)

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