|
Volumn 516, Issue 22, 2008, Pages 8096-8100
|
Characterization of sputtered and annealed niobium oxide films using spectroscopic ellipsometry, Rutherford backscattering spectrometry and X-ray diffraction
|
Author keywords
Ellipsometry; Niobium oxide; Optical properties; Radio frequency sputtering; Rutherford backscattering spectrometry; X ray diffraction
|
Indexed keywords
NIOBIUM;
NIOBIUM COMPOUNDS;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SPECTROSCOPIC ELLIPSOMETRY;
SPUTTER DEPOSITION;
TRANSITION METALS;
ELLIPSOMETRY;
NIOBIUM OXIDE;
NIOBIUM OXIDES;
OPTICAL PROPERTIES;
RADIO FREQUENCY SPUTTERING;
RUTHERFORD BACKSCATTERING SPECTROMETRY;
X-RAY DIFFRACTION;
OXIDE FILMS;
|
EID: 50649116580
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2008.04.070 Document Type: Article |
Times cited : (31)
|
References (17)
|