Spray-deposited Li-doped ZnO transistors with electron mobility exceeding 50 cm2/Vs

Advanced Materials

Volumn 22, Issue 42, 2010, Pages 4764-4769

  Adamopoulos, George ^a   Bashir, Aneeqa ^a   Thomas, Stuart ^a   Gillin, William P ^b   Georgakopoulos, Stamatis ^c   Shkunov, Maxim ^c   Baklar, Mohamed A ^a   Stingelin, Natalie ^a   Maher, Robert C ^a   Cohen, Lesley F ^a   Bradley, Donal D C ^a   Anthopoulos, Thomas D ^a  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

^b QUEEN MARY UNIVERSITY OF LONDON   (United Kingdom)

^c UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

ChargeTransport; Doping; Lithium; Transistors; Transparent Electronics; Zinc Oxide

Indexed keywords

CHARGE TRANSPORT; DOPED ZNO; DOPING; HIGH QUALITY; LITHIUM ACETATE; N-CHANNEL; POLYCRYSTALLINE ZNO; PRECURSOR SOLUTIONS; SPRAY-DEPOSITED; TRANSPARENT ELECTRONICS;

DOPING (ADDITIVES); ELECTRON MOBILITY; LITHIUM; SPRAY PYROLYSIS; THIN FILM TRANSISTORS; ZINC; ZINC OXIDE;

HIGH ELECTRON MOBILITY TRANSISTORS;

LITHIUM; ZINC OXIDE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; ELECTRIC CONDUCTIVITY; SEMICONDUCTOR; TEMPERATURE; X RAY DIFFRACTION;

ELECTRIC CONDUCTIVITY; LITHIUM; MICROSCOPY, ATOMIC FORCE; TEMPERATURE; TRANSISTORS, ELECTRONIC; X-RAY DIFFRACTION; ZINC OXIDE;

EID: 78149444851     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.201001444     Document Type: Article

References (32)

1. M. W. J. Prins, K. O. Grosseholz, G. Muller, J. F. M. Cillessen, J. B. Giesbers, R. P. Weening, R. M. Wolf, Appl. Phys. Lett. 1996, 68, 3650.
2. K. Nomura, H. Ohta, K. Ueda, T. Kamiya, M. Hirano, H. Hosono, Science 2003, 300, 1269.
3. E. Fortunato, A. Pimentel, L. Pereira, A. Goncalves, G. Lavareda, H. Aguas, I. Ferreira, C. N. Carvalho, R. Martins, J. Non-Cryst. Solids, 2004, 338, 806-809.
4. K. Nomura, H. Ohta, A. Takagi, T. Kamiya, M. Hirano, H. Hosono, Nature 2004, 432, 488.
5. R. L. Hoffman, B. H. Norris, J. F. Wager, Appl. Phys. Lett. 2003, 82, 733.
6. P. Barquinha, L. Pereira, G. Goncalves, R. Martins, E. Fortunato, J. Electrochem. Soc. 2009, 156, H161.
7. T. Miyasako, M. Senoo, E. Tokumitsu, Appl. Phys. Lett. 2005, 86, 162902.
8. Y. Shimura, K. Nomura, H. Yanagi, T. Kamiya, M. Hirano, and, H. Hosono, Thin Solid Films, 2008, 516, 5899.
9. J. Nishii, F. M. Hossain, A. Takagi, T. Aita, K. Saikusa, Y. Ohmaki, I. Ohkubo, S. Kishimoto, A. Ohtomo, T. Fukumura, F. Matsukura, Y. Ohno, H. Koinuma, H. Ohno, M. Kawasaki, Jpn. J. Appl. Phys. 2003, 42, L347-L349.
10. J. Jo, O. Seo, H. Choi, B. Lee, Appl. Phys. Express, 2008, 1, 041202.
11. L. Wang, M. H. Yoon, A. Facchetti, T. J. Marks, Adv. Mater. 2007, 19, 3252.
12. L. Wang, M. H. Yoon, G. Lu, Y. Yang, A. Facchetti, T. J. Marks, Nat. Mater. 2009, 5, 893.
13. E. Fortunato, P. Barquinha, A. Pimentel, L. Pereira, G. Goncalves, R. Martins, Phys. Status Solidi (RRL) 2007, 1, R34-R36.
14. N. L. Dehuff, E. S. Kettenring, D. Hong, H. Q. Chiang, J. F. Wager, R. L. Hoffman, C. H. Park, D. A. Keszler, J. Appl. Phys. 2005, 97, 064505.
15. P. Gorrn, P. Holzer, T. Riedl, W. Kowalsky, J. Wang, T. Weimann, P. Hinze, S. Kipp, Appl. Phys. Lett. 2007, 90, 063502.
16. P. Barquinha, L. Pereira, G. Goncalves, R. Martins, E. Fortunato, J. Electrochem. Soc. 2009, 156, H161.
17. B. N. Pal, P. Trottman, J. Sun, H. E. Katz, Adv. Funct. Mater. 2008, 18, 1832.
18. B. S. Ong, C. Li, Y. Li, Y. Wu, R. Loutfy, J. Am.Chem. Soc. 2007, 129, 2750.
19. H. C. Chenga, C. F. Chen, C. Y. Tsay, Appl. Phys. Lett. 2007, 90, 012113.
20. A. Bashir, P. H. Wbkenberg, J. Smith, J. M. Ball, G. Adamopoulos, D. D. C. Bradley, T. D. A. Anthopoulos, Adv. Mater. 2009, 21, 2226.
21. G. Adamopoulos, A. Bashir, P. H. Wobkenberg, D. D. C. Bradley, T. D. Anthopoulos, Appl. Phys. Lett. 2009, 95, 133507.
22. B. N. Pal, B. M. Dhar, K. C. See, H. E. Katz, Nat. Mater. 2009, 8, 899.
23. H. S. Kim, P. D. Byrne, A. Facchetti, T. J. Marks, J. Am. Chem. Soc. 2008, 130, 12580.
24. H. S. Kim, M. J. Kim, Y. G. Ha, M. G. Kanatzidis, T. J. Marks, A. Facchetti, J. Am.Chem. Soc. 2009, 131, 10826-10827.
25. D. H. Lee, Y. J. Chang, G. S. Herman, C. H. Chang, Adv. Mater. 2007, 19, 843.
26. Z. L. Mensinger, J. T. Gatlin, S. T. Meyers, L. N. Zakharov, D. A. Keszler, D. W. Johnson, Angew. Chem., Int. Ed. 2008, 47, 9484.
27. S. J. Seo, C. G. Choi, Y. H. Hwang, B. S. Bae, J. Phys. D. 2009, 42, 035106.
28. H. S. Kim, P. D. Byrne, A. Facchetti, T. J. Marks, J. Am. Chem. Soc. 2008, 130, 12580.
29. T. K. Gupta, J. Am. Ceram. Soc. 1990, 73, 1817.
30. W. B. Pearson, A handbook of lattice spacings and structures of metals and alloys, 1958, New York, Pergamon Press.
31. A. L. Patterson, Phys. Rev. 1939, 56, 978.
32. E. A. Davis, N. F. Mott, Philos. Mag. 1970, 22, 903.