Studies of radiofrequency plasma deposition of hexamethyldisiloxane films and their thermal stability and corrosion resistance behavior

Vacuum

Volumn 84, Issue 11, 2010, Pages 1327-1333

  Choudhury, Arup Jyoti ^a   Chutia, Joyanti ^a   Kakati, Hemen ^a   Barve, Shruti A ^b   Pal, Arup Ratan ^a   Sarma, Neelotpal Sen ^a   Chowdhury, Devasish ^a   Patil, Dinkar S ^b  

^a INSTITUTE OF ADVANCED STUDY IN SCIENCE AND TECHNOLOGY   (India)

^b BHABHA ATOMIC RESEARCH CENTRE   (India)

Author keywords

Corrosion test; Emissive probe; Hexamethyldisiloxane; Plasma assisted CVD; Thermogravimetric analysis

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; CORROSION TESTS; DEPOSITION PROCESS; DISCHARGE CHARACTERISTICS; EMISSIVE PROBE; FOURIER TRANSFORM INFRARED; FTIR ANALYSIS; HEXAMETHYLDISILOXANE; RADIO FREQUENCY PLASMA; RF REACTOR; RF-POWER; THERMAL STABILITY; WORKING PRESSURES;

ATMOSPHERIC CORROSION; CORROSION RESISTANCE; DIAMOND FILMS; ELECTRIC DISCHARGES; EMISSION SPECTROSCOPY; FILM PREPARATION; FOURIER TRANSFORMS; OPTICAL EMISSION SPECTROSCOPY; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA POLYMERIZATION; PLASMA STABILITY; PLASMAS; PROBES; THERMODYNAMIC STABILITY;

THERMOGRAVIMETRIC ANALYSIS;

EID: 78049423095     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2010.02.013     Document Type: Article

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