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Volumn 82, Issue 2 SPEC. ISS., 2007, Pages 290-293
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Characterisation of SiOxCyHz thin films deposited by low-temperature PECVD
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Author keywords
Atomic force microscopy; Gas barrier; HMDSO; PECVD
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CHARACTERIZATION;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
POLYETHYLENE TEREPHTHALATES;
SILICON COMPOUNDS;
SUBSTRATES;
GAS BARRIERS;
HEXAMETHYLDISILOXANE;
PLASMA REACTORS;
THIN FILMS;
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EID: 35248853316
PISSN: 0042207X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.vacuum.2007.07.001 Document Type: Article |
Times cited : (37)
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References (8)
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