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Volumn 82, Issue 2 SPEC. ISS., 2007, Pages 290-293

Characterisation of SiOxCyHz thin films deposited by low-temperature PECVD

Author keywords

Atomic force microscopy; Gas barrier; HMDSO; PECVD

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHARACTERIZATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYETHYLENE TEREPHTHALATES; SILICON COMPOUNDS; SUBSTRATES;

EID: 35248853316     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2007.07.001     Document Type: Article
Times cited : (37)

References (8)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.