Thin plasma-polymerized layers of hexamethyldisiloxane for humidity sensor development

Thin Solid Films

Volumn 517, Issue 15, 2009, Pages 4455-4460

  Guermat, N ^a   Bellel, A ^a   Sahli, S ^a   Segui, Y ^b   Raynaud, P ^b  

^a Universite Mentouri Constantine   (Algeria)

^b UNIVERSITÉ DE TOULOUSE   (France)

Author keywords

Fourier transform infrared spectroscopy; Humidity; Organosilicon; Plasma deposition; Sensor; Thin films

Indexed keywords

ABSORBING LAYERS; ALUMINUM ELECTRODES; CAPACITIVELY COUPLED; CLEAN GLASS SUBSTRATES; DEPOSITED FILMS; DIFFUSION PROCESS; ELECTRICAL IMPEDANCES; FILM DENSITIES; FOURIER TRANSFORM INFRA-RED SPECTROSCOPIES; FT-IR ANALYSIS; HEXAMETHYLDISILOXANE; HUMIDITY; HUMIDITY SENSING; HUMIDITY SENSING PROPERTIES; INTERDIGITATED STRUCTURES; LOW FREQUENCIES; ORGANOSILICON; PARALLEL PLATE REACTORS; PLASMA DISCHARGES; RELATIVE HUMIDITIES; REPRODUCIBILITY; RESISTIVE TYPES; SENSING FILMS; SENSITIVE LAYERS; SENSOR DESIGNS; SENSOR DEVELOPMENT; SI-H BONDINGS;

ALUMINA; ATMOSPHERIC HUMIDITY; CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLOW DISCHARGES; HUMIDITY CONTROL; HUMIDITY SENSORS; MOISTURE; PLASMA DEPOSITION; PLASMAS; POLYMERS; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS; THIN FILMS; WATER VAPOR;

FOURIER TRANSFORMS;

EID: 65549123951     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.084     Document Type: Article

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