Organic-inorganic behaviour of HMDSO films plasma-polymerized at atmospheric pressure

Surface and Coatings Technology

Volumn 203, Issue 10-11, 2009, Pages 1366-1372

  Morent, Rino ^a   De Geyter, Nathalie ^a   Van Vlierberghe, Sandra ^b   Dubruel, Peter ^b   Leys, Christophe ^a   Schacht, Etienne ^b  

^a FACULTÉ POLYTECHNIQUE DE MONS   (Belgium)

^b Faculty of Pharmaceutical Sciences   (Belgium)

Author keywords

Atomic force microscopy (AFM); Fourier transform infrared spectroscopy (FTIR); Hexamethyldisiloxane (HMDSO); PACVD

Indexed keywords

ANGLE MEASUREMENT; ARGON; ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; ATOMIC PHYSICS; ATOMIC SPECTROSCOPY; ATOMS; CHEMICAL PROPERTIES; CONTACT ANGLE; DIELECTRIC DEVICES; ELECTRIC DISCHARGES; ELECTRODEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS PERMEABLE MEMBRANES; GASES; INERT GASES; INFRARED SPECTROSCOPY; INORGANIC COATINGS; ORGANIC COATINGS; OXIDE MINERALS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; POLYETHYLENE TEREPHTHALATES; POLYMERS; PRESSURE; QUARTZ; SILICONES; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS; THERMOPLASTICS;

AIR CONTENT; ATOMIC FORCE MICROSCOPY (AFM); CARRIER GASES; CHEMICAL STRUCTURES; CONTACT-ANGLE MEASUREMENTS; DEPOSITED FILMS; DIELECTRIC BARRIER DISCHARGE (DBD); EQUIPMENT COSTS; FORCE MICROSCOPY; FOURIER TRANSFORM INFRARED SPECTROSCOPY (FTIR); GAS PHASE; GRADUAL CHANGES; HEXAMETHYLDISILOXANE (HMDSO); OPERATION CONDITIONS; ORGANIC-INORGANIC; PACVD; POLYETHYLENE TEREPHTHALATE (PET); WORKING GAS;

FOURIER TRANSFORMS;

EID: 58549089487     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2008.11.008     Document Type: Article

References (42)

1. Pan Y.V., Barrios E.Z., and Denton D.D. J. Polym. Sci., Part A: Polym. Chem. 36 (1998) 587
2. Zhang C., Wyatt J., and Weinkauf D.H. Polymer 45 (2004) 7665
3. Gengenbach T.R., and Griesser H.J. J. Polym. Sci., Part A: Polym. Chem. 36 (1998) 985
4. Borcia G., and Brown N.M.D. J. Phys. D: Appl. Phys. 40 (2007) 1927
5. Arefi F., Andre V., Montazerrahmati P., and Amouroux J. Pure Appl. Chem. 64 (1992) 715
6. Kasih T.P., Kuroda S., and Kubota H. Plasma Process. Polym. 4 (2007) 648
7. Sawada Y., Ogawa S., and Kogoma M. J. Phys. D: Appl. Phys. 28 (1995) 1661
8. Hiratsuka A., and Karube I. Electroanalysis 12 (2000) 695
9. Zajickova L., Bursikova V., Kucerova Z., Franta D., Dvorak P., Smid R., Perina V., and Mackova A. Plasma Sources Sci. Technol. 16 (2007) S123
10. Vallee C., Goullet A., Granier A., van der Lee A., Durand J., and Marliere C. J. Non-Cryst. Solids 272 (2000) 163
11. Kurosawa S., Harigae H., Aizawa H., Terashima K., and Suzuki H. J. Photopolym. Sci. Technol. 19 (2006) 253
12. Zajickova L., Bursikova V., Kucerova Z., Franclova J., Siahel P., Perina V., and Mackova A. J. Phys. Chem. Solids 68 (2007) 1255
13. Deilmann M., Grabowski M., Theiss S., Bibinov N., and Awakowicz P. J. Phys. D: Appl. Phys. 41 (2008) 135207
14. Hegemann D., Vohrer U., Oehr C., and Riedel R. Surf. Coat. Technol. 119 (1999) 1033
15. Hegemann D., Brunner H., and Oehr C. Surf. Coat. Technol. 142 (2001) 849
16. Saloum S., Naddaf M., and Alkhaled B. Vacuum 82 (2008) 742
17. Vautrin-Ul C., Boisse-Laporte C., Benissad N., Chausse A., Leprince P., and Messina R. Prog. Org. Coat. 38 (2000) 9
18. Zanini S., Riccardi C., Orlandi M., Esena P., Tontini M., Milani M., and Cassio V. Surf. Coat. Technol. 200 (2005) 953
19. Alexandrov S.E., and Hitchman M.L. Chem. Vap. Deposition 11 (2005) 457
20. De Geyter N., Morent R., and Leys C. Surf. Coat. Technol. 201 (2006) 2460
21. Morent R., De Geyter N., Axisa F., De Smet N., Gengembre L., De Leersnyder E., Leys C., Vanfleteren J., Rymarczyk-Machal M., Schacht E., and Payen E. J. Phys. D: Appl. Phys. 40 (2007) 7392
22. Muranyi P., Wunderlich J., and Heise M. J. Appl. Microbiol. 103 (2007) 1535
23. Kogelschatz U. Plasma Chem. Plasma Process. 23 (2003) 1
24. Wagner H.E., Brandenburg R., Kozlov K.V., Sonnenfeld A., Michel P., and Behnke J.F. Vacuum 71 (2003) 417
25. Massines F., and Gouda G. J. Phys. D: Appl. Phys. 31 (1998) 3411
26. Massines F., Messaoudi R., and Mayoux C. Plasmas Polym. 3 (1998) 43
27. Massines F., Rabehi A., Decomps P., Gadri R.B., Segur P., and Mayoux C. J. Appl. Phys. 83 (1998) 2950
28. Trunec D., Brablec A., and Stastny F. Contrib. Plasma Phys. 38 (1998) 435
29. Borcia G., Anderson C.A., and Brown N.M.D. Plasma Sources Sci. Technol. 14 (2005) 259
30. Hartley P.G., Thissen H., Vaithianathan T., and Griesser H.J. Plasmas Polym. 5 (2000) 47
31. Vignal V., Roux J.C., Olive J.M., Desjardins D., and Genton V. Acta Mater. 46 (1997) 149
32. T. Nozaki, Y. Unno, Y. Miyazaki, and K. Okazaki, Proceedings of 15th International Symposium on Plasma Chemistry 2001 (ISPC-15), Orléans-France, 77-83.
33. Massines F., Gherardi N., Fornelli A., and Martin S. Surf. Coat. Technol. 200 (2005) 1855
34. Radu I., Bartnikas R., and Wertheimer M.R. IEEE Trans. Plasma Sci. 31 (2003) 1363
35. Sublet A., Ding C., Dorier J.L., Hollenstein C., Fayet P., and Coursimault F. Plasma Sources Sci. Technol. 15 (2006) 627
36. Benissad N., Boisse-Laporte C., Vallee C., Granier A., and Goullet A. Surf. Coat. Technol. 119 (1999) 868
37. Li K., Gabriel O., and Meichsner J. J. Phys. D: Appl. Phys. 37 (2004) 588
38. Socrates G. Infrared and Raman Characteristic Group Frequencies - Tables and Charts (2001), John Wiley & Sons Ltd, West Sussex - England
39. Trunec D., Navratil Z., Stahel P., Zajickova L., and Bursikova V. J. Phys. D: Appl. Phys. 37 (2004) 2112
40. Ulejczyk B., Karpinski L., Scholz M., Ekwinska M.A., Rymuza Z., Opalinska T., Zukowska E.A., and Schmidt-Szalowski K. Czech. J. Phys. 56 (2006) B1383
41. Lamendola R., d' Agostino R., and Fracassi F. Plasmas Polym. 2 (1997) 147
42. Ji Y.Y., Hong Y.C., Lee S.H., Kim S.D., and Kim S.S. Surf. Coat. Technol. 202 (2008) 5663