The power source effect on SiOx coating deposition by plasma enhanced chemical vapor deposition

Thin Solid Films

Volumn 517, Issue 14, 2009, Pages 3850-3853

  Zhang, Junfeng ^a   Chen, Qiang ^a   Zhang, Yuefei ^a   Liu, Fuping ^a   Liu, Zhongwei ^a  

^a BEIJING INSTITUTE OF GRAPHIC COMMUNICATION   (China)

Author keywords

Mass spectroscopy; Middle frequency power; OTR; RF power; SiOx

Indexed keywords

MASS SPECTROSCOPY; MIDDLE FREQUENCY POWER; OTR; RF POWER; SIOX;

ELECTRIC DISCHARGES; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INDUCTIVELY COUPLED PLASMA; MASS SPECTROMETERS; MASS SPECTROMETRY; OXYGEN; OXYGEN PERMEABLE MEMBRANES; PLASMA DEPOSITION; SILICON COMPOUNDS; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS; VAPORS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 65449133096     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.161     Document Type: Article

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