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Volumn 18, Issue 10, 2002, Pages 4118-4123

Plasma polymerization of thin films: Correlations between plasma chemistry and thin film character

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; INDUCTIVELY COUPLED PLASMA; MASS SPECTROMETRY; OXIDATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA POLYMERIZATION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0037076664     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la011566j     Document Type: Article
Times cited : (24)

References (32)
  • 21
    • 0000482742 scopus 로고
    • Mass spectrometry of plasmas
    • Auciello, O., Flamm, D.L., Eds.; Academic Press: New York
    • Vasile, M.J.; Dylla, H.F. Mass Spectrometry of Plasmas. In Plasma Diagnostics; Auciello, O., Flamm, D.L., Eds.; Academic Press: New York, 1989; p 185.
    • (1989) Plasma Diagnostics , pp. 185
    • Vasile, M.J.1    Dylla, H.F.2
  • 26
    • 0004187776 scopus 로고    scopus 로고
    • IR and mass spectra
    • Lindstrom, P.J., Mallard, W.G., Eds.; National Institute of Standards and Technology: Gaithersburg, MD
    • Stein, S.E. IR and Mass Spectra. In NIST Chemistry WebBook, NIST Standard Reference Database; Lindstrom, P.J., Mallard, W.G., Eds.; National Institute of Standards and Technology: Gaithersburg, MD, 2001; Vol. 69.
    • (2001) NIST Chemistry WebBook, NIST Standard Reference Database , vol.69
    • Stein, S.E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.