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Volumn 254, Issue 18, 2008, Pages 5760-5765

Optimization of plasma parameters for high rate deposition of titanium nitride films as protective coating on bell-metal by reactive sputtering in cylindrical magnetron device

Author keywords

Anti corrosive; Bell metal; Cylindrical magnetron; Nano structured titanium nitride thin film; Reactive sputtering

Indexed keywords

MAGNETRONS; NANOSTRUCTURED MATERIALS; PROTECTIVE COATINGS; REACTIVE SPUTTERING; SCANNING ELECTRON MICROSCOPY; TITANIUM NITRIDE; X RAY DIFFRACTION;

EID: 44349118471     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.03.047     Document Type: Article
Times cited : (50)

References (48)
  • 6
    • 0032108669 scopus 로고    scopus 로고
    • Szikora B. Vacuum 50 3-4 (1998) 273
    • (1998) Vacuum , vol.50 , Issue.3-4 , pp. 273
    • Szikora, B.1
  • 48
    • 0038741350 scopus 로고
    • Institute of Metal Finishing, Butterworth Scientific, Birmingham
    • Carter V.E. Corrosion Testing for Metal Finishing vol. 53 (1982), Institute of Metal Finishing, Butterworth Scientific, Birmingham
    • (1982) Corrosion Testing for Metal Finishing , vol.53
    • Carter, V.E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.