ALE-reactor for large area depositions

Applied Surface Science

Volumn 112, Issue , 1997, Pages 251-254

  Skarp, Jarmo I ^a   Soininen, Pekka J ^a   Soininen, Pekka T ^a  

^a Microchemistry Ltd   (Finland)

Author keywords

Atomic layer epitaxy; Large area; Oxide coatings; Reactor; Thin films

Indexed keywords

ALUMINA; CHEMICAL REACTORS; DEPOSITION; GLASS; INORGANIC COATINGS; SILICON WAFERS; SUBSTRATES; THIN FILMS; ZINC OXIDE;

ATOMIC LAYER EPITAXY; LARGE AREA DEPOSITIONS;

EPITAXIAL GROWTH;

EID: 0031546861     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)01000-8     Document Type: Article

References (3)

1. T. Suntola, in: Atomic Layer Epitaxy, Handbook of Crystal Growth, ed. D.T.J. Hurle, Vol. 3 (Elsevier Science B.V., 1994) pp. 615-626.
2. V. Lujala, J. Skarp, M. Tammenmaa and T. Suntola, Appl. Surf. Sci. 82-83 (1994) 34-40.
3. H. Angus Macleod, Optical Coatings from Design through Manufacture (Thin Film Center, Inc., 1996).