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Volumn 355, Issue 2, 1996, Pages 129-134
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Quantification of antimony depth profiles in Sb-doped tin dioxide thin films
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Author keywords
[No Author keywords available]
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Indexed keywords
MASS SPECTROMETRY;
SECONDARY ION MASS SPECTROMETRY;
SEMICONDUCTOR MATERIALS;
THIN FILMS;
ANTIMONY ADDITION;
ATOMIC LAYER METHOD;
CHECK;
DEPOSITION PROCESS;
DEPTH PROFILE;
MULTICOMPONENT ANALYSIS;
TIN OXIDE;
CHEMICAL ANALYSIS;
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EID: 0030355596
PISSN: 09370633
EISSN: None
Source Type: Journal
DOI: 10.1007/s0021663550129 Document Type: Article |
Times cited : (12)
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References (16)
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