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Volumn 356, Issue 41-42, 2010, Pages 2192-2197

Optical characterization of SnO2:F films by spectroscopic ellipsometry

Author keywords

SnO2:F films; Spectroscopic ellipsometry (SE); Ultrasonic spray pyrolysis; UV

Indexed keywords

BAND GAPS; BAND TAILING; ELLIPSOMETRIC ANGLES; NON DESTRUCTIVE; NON-CONTACT; OPTICAL ANALYSIS; OPTICAL CHARACTERIZATION; OPTICAL METHODS; OPTICAL TECHNIQUE; ROOM TEMPERATURE; SNO2:F FILMS; SOURCE POINTS; TRANSMITTANCE SPECTRA; ULTRASONIC SPRAY PYROLYSIS; ULTRASONIC SPRAY PYROLYSIS TECHNIQUE; UV;

EID: 77957154300     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2010.07.007     Document Type: Article
Times cited : (33)

References (68)
  • 68
    • 0004203026 scopus 로고    scopus 로고
    • Optical Process in Semiconductors
    • Englewood Cliffs, NJ:Prentice-Hall
    • Pankove J I Optical Process in Semiconductors, Solid State Physical Series (Englewood Cliffs, NJ:Prentice-Hall) p 422.
    • Solid State Physical Series , pp. 422
    • Pankove, J.I.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.