Effect of freon flow rate on tin oxide thin films deposited by chemical vapor deposition

Applied Surface Science

Volumn 220, Issue 1-4, 2003, Pages 175-180

  Fang, Te Hua ^a   Chang, Win Jin ^b  

^a SOUTHERN TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b KUN SHAN UNIVERSITY   (Taiwan)

Author keywords

Chemical vapor deposition; Freon; Thin films; Tin oxide; X ray diffraction

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); ENERGY DISPERSIVE SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; TIN COMPOUNDS;

DIFFRACTION PATTERNS;

THIN FILMS;

EID: 0142217303     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00817-1     Document Type: Article

References (14)

1. Fang Y.K., Lee J.J. Thin Solid Films. 169:1989;51.
2. Chopra K.L., Major S., Pandya D.K. Thin Solid Films. 102:1983;1.
3. Angelis L.D., Minnaja N. Sens. Actuators B. 3:1991;197.
4. Ansari S.G., Gosavi S.W., Gangal S.A., Karekar R.N., Aiyer R.C.J. Mater. Sci.: Mater. Electron. 8:1997;23.
5. Kim K.S., Yoon S.Y., Lee W.J., Kim K.H. Surf. Coatings Technol. 138:2001;229.
6. Jarzebski Z.M., Marton J.P. J. Electrochem. Soc. 123:1976;333.
7. Yusta F.J., Hichman M.L., Shamlian H.J. Mater. Chem. 7:1997;1421.
8. Ray S.C., Karanjai M.K., Dasgupta D. Thin Solid Films. 307:1997;221.
9. Fraser D.B., Cook H.D. J. Electrochem. Soc. 119:1972;1368.
10. Reddy S., Malik A.K., Jawalekar S.R. Thin Solid Films. 143:1986;113.
11. Park S.S. Mackenzie. J. Thin Solid Films. 258:1995;268.
12. Wan C.F., McGrath R.D., Keenan W.F., Frank S.N. J. Electrochem. Soc. 136:1989;1459.
13. Carroll A.F., Slack L.H. J. Electrochem. Soc. 123:1976;1889.
14. Zhou Z.B., Cui R.Q., Pang Q.J., Wang Y.D., Meng F.Y., Sun T.T.et al. Appl. Surf. Sci. 172:2001;245.