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Materials Science and Engineering: B

Volumn 95, Issue 2, 2002, Pages 171-179

Microstructure of indium tin oxide films deposited on porous silicon by rf-sputtering

(4) Ghosh, S a Kim, Hyunsoo a Hong, Kwangpyo a Lee, Chongmu a

a Inha University (South Korea)

Author keywords

Indium tin oxide (ITO); Microstructure; Photoluminiscence; Porous silicon (PS); Rf sputtering

Indexed keywords

ANODIC OXIDATION; CONDUCTIVE FILMS; CRYSTAL GROWTH; CRYSTAL MICROSTRUCTURE; HETEROJUNCTIONS; INTERFACES (MATERIALS); PHOTOLUMINESCENCE; POROUS SILICON; SEMICONDUCTING TIN COMPOUNDS; SEMICONDUCTOR DIODES; SINGLE CRYSTALS; SPUTTER DEPOSITION;

OXYGEN PARTIAL PRESSURE;

THIN FILMS;

EID: 0036683463 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/S0921-5107(02)00231-3 Document Type: Article

Times cited : (26)

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