Spectroscopic ellipsometric characterization of organic films obtained via organic vapor phase deposition

Applied Physics A: Materials Science and Processing

Volumn 80, Issue 3, 2005, Pages 551-555

  Himcinschi, C ^a   Meyer, N ^b   Hartmann, S ^c   Gersdorff, M ^b   Friedrich, M ^a   Johannes, H H ^c   Kowalsky, W ^c   Schwambera, M ^b   Strauch, G ^b   Heuken, M ^b   Zahn, D R T ^a  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

^b AIXTRON AG   (Germany)

^c TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; PARAMETER ESTIMATION; SILICON WAFERS; SPECTROSCOPY; SUBSTRATES; THIN FILMS; VAPOR DEPOSITION;

LARGE-AREA SUBSTRATES; ORGANIC VAPOR PHASE DEPOSITION (OVPD); REACTOR WALLS; SPECTRAL RANGE;

PLASTIC FILMS;

EID: 10844270495     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-2973-7     Document Type: Article

References (20)

1. L.C. Palilis, A.J. Mäkinen, M. Uchida, Z.H. Kafafi: Appl. Phys. Lett. 82, 2209 (2003)
2. W. Gao, A. Kahn: J. Appl. Phys. 94, 359 (2003)
3. L.S. Hung, C.H. Chen: Mater. Sci. Eng. R39, 143 (2002)
4. C.H. Kim, J. Shinar: Appl. Phys. Lett. 80, 2201 (2002)
5. T. Mon, H.-G. Kim, T. Mizutani, D.-C. Lee: Jpn. J. Appl. Phys. 40, 5346 (2001)
6. M. Baldo, M. Deitsch, P. Burrows, H. Gossenberger, M. Gerstenberger, V. Ban, S. Forrest: Adv. Mater. 10, 1505 (1998)
7. M. Shtein, P. Peumans, J.B. Benziger, S.R. Forrest: J. Appl. Phys. 93, 4005 (2003)
8. M. Schwambera, N. Meyer, M. Gersdorff, M. Reinhold, G. Strauch, M. Heuken: in Dig. Tech. Pap. SID 2003 Int. Symp., p. 1419
9. R.M.A. Azzam, N.M. Bashara: Ellipsometry and Polarized Light (Elsevier, Amsterdam 1987)
10. J.A. Woollam, B.D. Johs, C.M. Herzinger, J.N. Hilfiker, R.A. Synowicki, C.L. Bungay: SPIE Proc. Crit. Rev. CR72, 3 (1999)
11. C.M. Herzinger, B. Johs, W.A. McGahan, J.A. Woollam, W. Paulson: J. Appl. Phys. 83, 3323 (1998)
12. G.E. Jellison: Opt. Mater, 1, 41 (1992); I.H. Malitson: J. Opt. Soc. Am. 55, 1205 (1965)
13. G.E. Jellison: Opt. Mater, 1, 41 (1992); I.H. Malitson: J. Opt. Soc. Am. 55, 1205 (1965)
14. B. Masenelli, S. Callard, A. Gagnaire, J. Joseph: Thin Solid Films 364, 264 (2000)
15. P.E. Burrows, S.R. Forrest: Appl. Phys. Lett. 64, 2285 (1994)
16. F.G. Celii, T.B. Harton, O.F. Phillips: J. Electron. Mater. 26, 366 (1997)
17. A.B. Djurisic, C.Y. Kwong, W.L. Guo, T.W. Lau, E.H. Li, Z.T. Liu, H.S. Kwok, L.S.M. Lam, W.K. Chan: Thin Solid Films 416, 233 (2002)
18. A.A. Aziz, K.L. Narasimhan: Synth. Met. 114, 133 (2000)
19. K.A. Higginson, X.M. Zhang, F. Papadimitrakopoulos: Chem. Mater. 10, 1017 (1998)
20. W. Xie, Y. Zhao, J. Hou, S. Liu: Jpn. J. Appl. Phys. 42, 1466 (2003)