A study on low cost-high conducting fluorine and antimony-doped tin oxide thin films

Applied Surface Science

Volumn 249, Issue 1-4, 2005, Pages 183-196

  Elangovan, E ^a,b   Ramamurthi, K ^a  

^a BHARATHIDASAN UNIVERSITY   (India)

^b UNIVERSIDADE NOVA DE LISBOA   (Portugal)

Author keywords

Semiconductors; SnCl 2 precursor and electrical properties; Spray pyrolysis; Tin oxide thin films

Indexed keywords

ANTIMONY; ATOMIC FORCE MICROSCOPY; CONCENTRATION (PROCESS); DOPING (ADDITIVES); FLUORINE; GROWTH (MATERIALS); PYROLYSIS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS; SOLUTIONS; TIN COMPOUNDS; X RAY DIFFRACTION;

GROWTH RATES; SNCL2 PRECURSOR AND ELECTRICAL PROPERTIES; SPRAY PYROLYSIS; TIN OXIDE THIN FILMS;

THIN FILMS;

EID: 21244492316     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.11.074     Document Type: Article

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